Unlock instant, AI-driven research and patent intelligence for your innovation.

A kind of synthetic method of acrylic resin for photosensitive dry film

A photosensitive dry film, photosensitive resin technology, applied in epoxy resin coatings, photosensitive materials for optomechanical equipment, coatings, etc., can solve the problems of decline in the development process, air bubbles, development residues, etc., and achieve high yields , Simple operation, cost-saving effect

Active Publication Date: 2021-06-04
湖南初源新材料股份有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The photosensitive three-layer dry film used for printed circuit boards is also very popular. However, the currently commercially available three-layer photosensitive dry film is prone to air bubbles when the film is attached, and at the same time, it is easy to cause residual glue during the development process, resulting in a decline in the development process.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of synthetic method of acrylic resin for photosensitive dry film
  • A kind of synthetic method of acrylic resin for photosensitive dry film
  • A kind of synthetic method of acrylic resin for photosensitive dry film

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0050] In order to solve the above problems, the invention provides a method for preparing a photosensitive dry film, comprising the following steps:

[0051] S1: preparation of photosensitive resin composition;

[0052] A1: preparing epoxy acrylate prepolymer;

[0053] A2: preparation of modified styrene-acrylate copolymer;

[0054] A3: prepare photosensitive adhesive;

[0055] A4: prepare resin composition;

[0056] S2: coating and drying;

[0057] S3: Paste the protective film;

[0058] S4: heating and cutting the dry film.

[0059] As a preferred technical solution, the preparation method of the photosensitive dry film comprises the following steps:

[0060] S1: preparation of photosensitive resin composition;

[0061] A1: preparing epoxy acrylate prepolymer;

[0062] A2: preparation of modified styrene-acrylate copolymer;

[0063] A3: prepare photosensitive adhesive;

[0064] A4: prepare resin composition;

[0065] S2: coating and drying;

[0066] Apply the ph...

Embodiment 1

[0132] Embodiment 1 provides a kind of preparation method of photosensitive dry film, comprises the following steps:

[0133] S1: preparation of photosensitive resin composition;

[0134] A1: Preparation of epoxy acrylate prepolymer

[0135] Weigh E-44 epoxy resin and acrylic acid in a weight ratio of 1:2, add 3.5% onium salt of the total mass of the system as a catalyst, heat in a water bath, raise the temperature to 65°C, and stir for 4 hours to prepare an epoxy acrylate prepolymer ;

[0136] A2: Preparation of modified styrene-acrylate copolymer

[0137] Weigh the reaction monomer according to the formula, stir it evenly and add it to the reaction kettle, add 2.5% azobisisoheptanonitrile initiator of the total weight of the monomer, keep the temperature of the water bath at 35°C, stir for 40min, heat up to 90°C, continue Stir for 3.5h to obtain styrene-acrylate copolymer;

[0138] Add 2% toluenesulfonic acid of the total amount of monomers, and then add 4 parts of (3S)-...

Embodiment 2

[0153] Example 2 provides a method for preparing a photosensitive dry film, the preparation method is the same as that of Example 1, the difference is that the photosensitive resin composition comprises the following components in parts by weight:

[0154] 20 parts of epoxy acrylate prepolymer, 50 parts of modified styrene-acrylate copolymer, 13.5 parts of alkali-soluble resin, 0.6 part of photoinitiator and 1 part of dye.

[0155] The modified styrene-acrylate copolymer is obtained by (3S)-2,3-dihydro-6-hydroxyl-3-benzofuran acetate modified styrene-acrylate copolymer; the styrene - The reaction monomer of the acrylate copolymer is styrene, methyl methacrylate, ethyl acrylate, and methacrylic acid is combined in a weight ratio of 1:3:4:3; the alkali-soluble resin is polyethylene glycol diacrylic acid 12 parts of ester, 0.1 part of pentaerythritol triacrylate, 0.1 part of 1,6-hexanediol diacrylate, 0.1 part of 2-phenoxyethyl acrylate and 1.2 parts of triethylene glycol dimetha...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
widthaaaaaaaaaa
widthaaaaaaaaaa
widthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a three-layer film, more specifically a method for preparing a photosensitive dry film. The invention provides a method for preparing a photosensitive dry film, comprising the following steps: S1: preparation of a photosensitive resin composition; A1: preparation of an epoxy acrylate prepolymer; A2: preparation of a modified styrene-acrylate copolymer; A3: Preparation of photosensitive adhesive; A4: Preparation of resin composition; S2: Coating and drying; S3: Attaching protective film; S4: Heating and cutting dry film. The invention can not only enhance the fatigue resistance, friction resistance and dimensional stability of the photosensitive dry film, but also ensure that no air bubbles will be generated during the film sticking process, the operation is simple, and the cost is saved. In the developing process of the present invention, no developing residual glue will be produced, thereby ensuring a higher yield rate.

Description

technical field [0001] The invention relates to a three-layer film, more specifically a method for preparing a photosensitive dry film. Background technique [0002] The photosensitive dry film is composed of three layers, which are support film layer, resist layer and protective film layer. Among them, the main function of the supporting film layer and the protective film layer is to support and protect the resist layer located in the middle. The dry film is a polymer compound, which can produce a polymerization reaction (the reaction process of synthesizing a polymer from a monomer) after being irradiated by ultraviolet rays to form a stable substance attached to the board surface, so as to prevent electroplating and etching function. [0003] With the development of modern electronics, especially the demand for printed circuit boards is steadily increasing every year. The photosensitive three-layer dry film used for printed circuit boards is also very popular. However,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08J7/04C08J7/046C08L67/02G03F7/004C09D125/14C09D163/10
CPCC08J2367/02C08J2425/14C09D125/14C08J7/0427G03F7/004C08L63/10
Inventor 肖志义
Owner 湖南初源新材料股份有限公司