Unlock instant, AI-driven research and patent intelligence for your innovation.

Maintenance method of high-current ion implanter measurement indicating device

A technology of ion implanter and indicating device, which is applied in the direction of circuits, discharge tubes, electrical components, etc., can solve the problems of wasting time, increasing water vapor, etc., achieve quality assurance, reduce water vapor and particles, and save time for replacing measuring filaments Effect

Active Publication Date: 2019-04-12
SHANGHAI HUALI MICROELECTRONICS CORP
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This will not only waste a lot of time, but also increase water vapor, allowing impurities in the air to enter the chamber

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Maintenance method of high-current ion implanter measurement indicating device
  • Maintenance method of high-current ion implanter measurement indicating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0032] It should be noted that, in the case of no conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other.

[0033] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

[0034] Such as figure 1 As shown, a maintenance method for a measurement indicator device is suitable for ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Disclosed is a high-current ion implanter. A reaction chamber matched with the high-current ion implanter is provided with a measurement indicating device, wherein the measurement indicating device isused for measuring the vacuum value in the reaction chamber, and giving out alarming when the vacuum value exceeds a preset threshold value; the measurement indicating device is characterized in thata measuring channel is formed between the measurement indicating device and a measuring interface of the reaction chamber; and opening and closing of the measuring channel is controlled through a hand valve arranged on the measuring channel. By adoption of the maintenance method of the high-current ion implanter measurement indicating device provided by the invention, the time for replacing measuring filaments is saved, and water vapor and particles in the air which enter the chamber are reduced, so that the quality of the product is guaranteed, and the method is more convenient and more practical.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuit manufacturing, in particular to a maintenance method for a measuring and indicating device of a high-current ion implantation machine. Background technique [0002] When the existing high-current ion implanter is running the goods, the measurement indicator device may break the filament, etc. The equipment engineer will first switch the measurement filament, and continue to run the goods after the display is normal. If switching to NG, the equipment engineer will Stop the equipment, open the cavity to replace the measuring filament. This will not only waste a lot of time, but also increase water vapor, so that impurities in the air will enter the chamber. Contents of the invention [0003] The object of the present invention is to provide a maintenance method for a measuring and indicating device of a high-current ion implanter to solve the above technical problems. The technica...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/244H01J37/317
CPCH01J37/244H01J37/3171
Inventor 金志豪石庆球张聪
Owner SHANGHAI HUALI MICROELECTRONICS CORP