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Preparation method of micro-nano structured substrate and micro-nano fluidic chip and device

A technology of micro-nano structure and micro-nano fluid control, applied in the field of detection, can solve problems such as high cost and inability to achieve large area

Pending Publication Date: 2019-04-23
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Existing nanostructures of different sizes are mostly produced by electron beam exposure and etching processes, and the maximum size of the substrate can only be 12 inches, which cannot achieve large-scale and high cost

Method used

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  • Preparation method of micro-nano structured substrate and micro-nano fluidic chip and device
  • Preparation method of micro-nano structured substrate and micro-nano fluidic chip and device
  • Preparation method of micro-nano structured substrate and micro-nano fluidic chip and device

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preparation example Construction

[0042] An embodiment of the present application provides a method for preparing a micro-nano structure substrate, referring to figure 1 , the preparation method may include:

[0043] Step 101: providing a substrate, and forming a first film layer on the substrate, where the first film layer includes a first region and a second region. refer to figure 2 A schematic diagram of the cross-sectional structure of the completed first film layer is shown.

[0044] Specifically, the base material may be glass, PI, or the like.

[0045] The material of the first film layer may be inorganic materials such as SiO and SiN, metal materials such as Al and Mo, or organic materials such as PR glue.

[0046] The thickness of the first film layer may be greater than or equal to 10 nm and less than or equal to 1 μm.

[0047] The thickness of the first film layer in the first region and the second region may be the same, so that the first film layer can be obtained by directly forming a speci...

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Abstract

The inventio provides a preparation method of a micro-nano structured substrate and a micro-nano fluidic chip and device. A first micro-nano structure and a second micro-nano structure are formed stepby step and accordingly can be different in size; meanwhile, during the process of forming the first micro-nano structure in a first area, a second film protects the second area of a first film, andduring the process of forming the second micro-nano structure in the second area, a third film protects the first micro-nano structure; with protection of the second film and the third film, various patterning processes such as nano-imprinting and laser interference etching can be applied to forming the first micro-nano structure and the second micro-nano structure, restriction to electron beam lithography can be avoided, so that the preparation method of the micro-nano structured substrate can be applied to preparing large-area micro-nano structured substrates and meanwhile reduce the cost and achieve higher flexibility and productivity.

Description

technical field [0001] The invention relates to the technical field of detection, in particular to a preparation method of a micro-nano structure substrate, a micro-nano fluidic chip and a device. Background technique [0002] Microfluidic chips emerged in 1992 as a science and technology for manipulating microfluids in micron-scale channels. Due to their fast, efficient and low sample consumption, they have been widely used in biochemical analysis, drug screening, and environmental testing. and other fields. In recent years, with the rapid development of microfluidic chips and the progress of nanofabrication technology, nanofluidic chips have attracted more and more attention. Since the channel scale changes from micrometer to nanometer, which is in the same order of magnitude as biomacromolecules such as DNA and protein, nanofluidic chips can be applied to single-molecule detection, control and separation of biomacromolecules. For different types of biomacromolecules, th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01L3/00
CPCB01L3/5027
Inventor 张笑
Owner BOE TECH GRP CO LTD