Unlock instant, AI-driven research and patent intelligence for your innovation.

Mask cleaning device and mask cleaning method

A cleaning device and mask technology, applied in cleaning methods and utensils, chemical instruments and methods, vacuum evaporation plating, etc., can solve problems such as material limitations, achieve easy application, reduce cleaning time and cost, and improve productivity Effect

Inactive Publication Date: 2021-03-16
DAWONSYS
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, for the inkjet printing method in the formation method of the polymer or low molecular light emitting layer, the material of the organic layer other than the light emitting layer is limited, and there is a trouble of forming a structure for inkjet printing on the substrate.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask cleaning device and mask cleaning method
  • Mask cleaning device and mask cleaning method
  • Mask cleaning device and mask cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] Various preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0042] The purpose of providing the embodiments of the present invention is to describe the present invention more completely to those skilled in the art. The following embodiments can be modified into various forms, and are not intended to limit the scope of the present invention. Rather, these embodiments are provided to make this disclosure more substantial and complete, and to fully convey the idea of ​​the present invention to those skilled in the art. In addition, for convenience and clarity of description, the thickness or size of each layer in the drawings may be exaggerated.

[0043] figure 1 It is a cross-sectional view conceptually showing the mask cleaning apparatus 100 according to some embodiments of the present invention.

[0044] First, if figure 1 As shown, the mask cleaning device 100 according to some embodiments o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a mask cleaning device and a mask cleaning method, which can clean organic matter remaining on the surface of a metal mask for an organic light-emitting device. The mask cleaning device may include: a vacuum chamber, in which a storage space capable of accommodating a mask is formed, and a vacuum environment is formed in the inside, so that organic matter remaining on the mask can be easily removed; the first cleaning light irradiates A device capable of irradiating cleaning light to the mask housed in the vacuum chamber, thereby applying light energy to the organic matter in the vacuum environment, so as to decompose and separate the organic matter from the mask to removing; and a control unit capable of supplying pulse wave power to the first cleaning light irradiation device.

Description

technical field [0001] The present invention relates to a mask cleaning device and a mask cleaning method, more specifically, to a mask cleaning device and mask cleaning method capable of cleaning organic matter remaining on the surface of a metal mask for an organic light-emitting device. Background technique [0002] The organic electroluminescent display device in the flat panel display device has a high response speed, low power consumption, and since it is self-illuminating, there is no problem of viewing angle, so it is suitable for a dynamic image display medium regardless of the size of the device. In addition, it can be produced at a low temperature, and the manufacturing process is based on existing semiconductor process technology and is simple, so it is attracting attention as a next-generation flat panel display device. In addition, the organic film used in the organic electroluminescence display device emits light by itself, so the multi-layer organic film can ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L51/56H01L51/00C23C14/04C23C14/56B08B7/00
CPCC23C14/042C23C14/564B08B7/0035H10K71/166H10K71/00
Inventor 朴善淳李海龙朴南奎金东训池成勋洪沅义朴永一
Owner DAWONSYS