Irradiation sources, inspection equipment, and inspection methods for inspection equipment
A technology for inspecting equipment and irradiation sources, applied in optomechanical equipment, X-ray equipment, microlithography exposure equipment, etc., can solve problems such as difficulty in achieving surface flatness
Active Publication Date: 2022-01-18
ASML NETHERLANDS BV
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Problems solved by technology
Tilt errors are particularly problematic in the soft X-ray region because the surface flatness of an optical surface is described in terms of the wavelength of radiation incident on the surface; it is much more difficult to achieve acceptable surface flatness for smaller wavelengths
Method used
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Embodiment Construction
[0025] Before describing embodiments of the invention in detail, it is instructive to demonstrate an exemplary environment in which embodiments of the invention may be implemented.
[0026] figure 1 A lithographic apparatus LA is schematically depicted. The apparatus comprises an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. UV radiation or DUV or EUV radiation), configured to support a patterning device (e.g. a mask) MA and connected to a Parameters A patterning device mount or support structure (e.g., a mask stage) MT of a first positioner PM for precisely positioning the patterning device; each configured to hold a substrate (e.g., a resist-coated wafer) W and two substrate handling stages (e.g., wafer handling stages) WTa and WTb each connected to a second positioner PW configured for precisely positioning the substrate according to certain parameters; MA imparts to a projection system (eg, a refractive projection lens system) PS ...
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An inspection apparatus and associated method for measuring a target structure on a substrate are disclosed. The inspection device comprises an illumination source for generating measurement radiation; optics for focusing the measurement radiation onto said target structure; and compensation optics. The compensating optics may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation in order to compensate for non-uniform manufacturing defects in said optics. In alternative embodiments, compensation optics may be located in the beam of measurement radiation, or in the pump radiation beam used to generate higher order harmonic radiation in the HHG source. Where situated in the beam of pump radiation, compensation optics may be used to correct for pointing errors, or to impart a desired distribution, or varying illumination pattern, in the beam of measurement radiation.
Description
[0001] Cross References to Related Applications [0002] This application claims priority to EP application 16188816.9 filed on September 14, 2016 and which application is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to a lithographic apparatus and a method for performing measurements. In particular, it relates to an inspection apparatus comprised in a lithographic apparatus, and in particular an illumination source thereof, and a method for performing measurements therewith. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, typically onto a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively called a mask or reticle, may be used to create the circuit pattern to be formed on the individual layers of the IC. The pattern can be ...
Claims
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IPC IPC(8): G01N21/95G03F7/20
CPCG01N21/9501G03F7/70616G01N2021/95676H05G2/00G01N21/8806H05G2/008G03F7/70141G03F7/7065
Inventor P·D·范福尔斯特林楠S·B·鲁博尔S·G·J·马斯杰森S·T·范德波斯特
Owner ASML NETHERLANDS BV