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Device for transmitting electrical signals, and lithography system

A technology for transmitting electrical signals and lithography equipment, which is applied in the direction of microlithography exposure equipment, photomechanical equipment, photolithography exposure equipment, etc., to achieve the effect of reducing mechanical connections and reducing shielding measures

Active Publication Date: 2019-05-03
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this solution has a correspondingly large space requirement and therefore cannot always be used

Method used

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  • Device for transmitting electrical signals, and lithography system
  • Device for transmitting electrical signals, and lithography system
  • Device for transmitting electrical signals, and lithography system

Examples

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Embodiment Construction

[0083] Unless otherwise indicated, the same reference numerals have been given to the same elements or elements having the same function in the figures.

[0084] Figure 1a A schematic diagram of an EUV lithographic apparatus 100A comprising a beam shaping and illumination system 102 and a projection system 104 is shown. EUV in this case stands for "extreme ultraviolet" (EUV) and denotes the wavelength of the working light (also called the radiation used) between 0.1 and 30 nm. The beam shaping and illumination system 102 and the projection system 104 are arranged in the vacuum enclosure 101 . The vacuum housing 101 is evacuated by means of evacuating means (not shown). The vacuum enclosure 101 is surrounded by a mechanical chamber (not shown) in which eg a controller for setting the optical elements is provided.

[0085] For transmitting electrical signals, the lithographic apparatus 100A includes a device 1 . The device 1 comprises a first interface 11 arranged on a first...

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Abstract

The invention relates to a device (1) for transmitting electrical signals between a first interface element (11), arranged at a first structure (10) of a lithography system (100), and a second interface element (21), arranged at a second structure (20) of the lithography system (100), an electrical conductor (30) connecting the first interface element (11) and the second interface element (21). The device further has a hollow body (40) which surrounds at least sections of the electrical conductor (30) and which is designed for the electromagnetic shielding of the electrical conductor (30). A gap (43) is provided in the hollow body (40) or between the hollow body (40) and one of the structures (10, 20) and allows a relative movement of the first structure (10) and the second structure (20)to mechanically decouple the first structure (10) from the second structure (20).

Description

[0001] Cross References to Related Applications [0002] The priority application DE 10 2016 217 285.9 is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to a device for transmitting electrical signals, and a lithographic apparatus comprising such a device. Background technique [0004] For example, photolithography is used to fabricate microstructured and nanostructured components, such as integrated circuits. The lithographic process is performed by a lithographic apparatus including an illumination system and a projection system. In this case, the image of the mask (reticle) illuminated by the illumination system is projected by the projection system onto a substrate (e.g. silicon wafer) to facilitate the transfer of the mask structure to the photosensitive coating of the substrate. [0005] Thus, the projected or used light is used to image the lithographic structure onto the image plane or wafer plane. The desire to a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70808G03F7/709G03F7/70991G03F7/70908G03F7/70941G03F7/70841
Inventor J.霍恩S.布莱迪斯特尔F.巴特M.豪夫
Owner CARL ZEISS SMT GMBH