Growing method of Al-Ga-As-Sb four-component material
A growth method, four-component technology, applied in sustainable manufacturing/processing, electrical components, climate sustainability, etc., can solve problems such as energy loss, material quality degradation, easy growth, etc., to solve the limitation of material growth, Avoid the effect of competition
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Embodiment 1
[0037] Put the InP substrate into the growth chamber of the MBE system, and the vacuum degree is required to be better than 1×10 -6 torr
[0038] Heating the substrate to 500-700°C to remove the residual oxide layer on the surface of the substrate.
[0039] Lower the deoxidation temperature by 10-200°C to grow a layer of In that matches the InP substrate lattice. 0.53 Ga 0.47 The As buffer layer has a thickness of 100-1000nm.
[0040] On the basis of the buffer layer, grow a layer of AlAs with a thickness of d1 y Sb 1-y Material.
[0041] Grow a layer of GaAs with a thickness of d2 y Sb 1-y materials, of which:
[0042]
[0043] GR is the growth rate of the corresponding material. We can adjust the corresponding growth rate by adjusting the temperature of Al, As, Sb, and Ga sources, in order to achieve lattice matching with InP.
[0044] The selection of y should take into account both the lattice matching degree of InP and InP, so 0.4
[0045]...
Embodiment 2
[0053] Put the InP substrate into the growth chamber of the MBE system, and the vacuum degree is required to be better than 1×10 -6 torr;
[0054] Heating the substrate to 500-700°C to remove the residual oxide layer on the surface of the substrate.
[0055] Lower the deoxidation temperature by 10-200°C to grow a layer of In that matches the InP substrate lattice. 0.52 Al 0.48 The As buffer layer has a thickness of 100-1000nm.
[0056] On the basis of the buffer layer, grow a layer of Al with a thickness of d1 x Ga 1-x As material, re-grow a layer of Al with a thickness of d2 x Ga 1-x Sb material, where:
[0057]
[0058] GR is the growth rate of the corresponding material. We can adjust the corresponding growth rate by adjusting the temperature of Al, Ga, As, Sb source.
[0059] For the control of the As component y,
[0060]
[0061] Thanks Al x Ga 1-x As y Sb 1-y To be used as the top section material, its forbidden band width is required to be greater t...
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