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Growing method of Al-Ga-As-Sb four-component material

A growth method, four-component technology, applied in sustainable manufacturing/processing, electrical components, climate sustainability, etc., can solve problems such as energy loss, material quality degradation, easy growth, etc., to solve the limitation of material growth, Avoid the effect of competition

Active Publication Date: 2019-05-14
SUZHOU KUNYUAN OPTOELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

three-component AlAs 0.56 Sb 0.44 It matches the InP lattice and is easy to grow, but its direct band gap is EΓ=2.5eV, and its indirect band gap EX=1.85eV. The energy difference between the two is large, so a considerable part of the photogenerated carriers generated in the Γ energy valley will be released. Reaching the X energy valley, causing significant energy loss
But the four-component Al x Ga 1-x As y Sb 1-y There is a certain miscibility gap, and the material in the miscibility gap is in a metastable state, which is prone to decomposition and forms a stable two-phase or three-phase structure, resulting in a serious decline in material quality
Therefore, it is difficult for this material to grow in thermodynamic equilibrium

Method used

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  • Growing method of Al-Ga-As-Sb four-component material
  • Growing method of Al-Ga-As-Sb four-component material
  • Growing method of Al-Ga-As-Sb four-component material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Put the InP substrate into the growth chamber of the MBE system, and the vacuum degree is required to be better than 1×10 -6 torr

[0038] Heating the substrate to 500-700°C to remove the residual oxide layer on the surface of the substrate.

[0039] Lower the deoxidation temperature by 10-200°C to grow a layer of In that matches the InP substrate lattice. 0.53 Ga 0.47 The As buffer layer has a thickness of 100-1000nm.

[0040] On the basis of the buffer layer, grow a layer of AlAs with a thickness of d1 y Sb 1-y Material.

[0041] Grow a layer of GaAs with a thickness of d2 y Sb 1-y materials, of which:

[0042]

[0043] GR is the growth rate of the corresponding material. We can adjust the corresponding growth rate by adjusting the temperature of Al, As, Sb, and Ga sources, in order to achieve lattice matching with InP.

[0044] The selection of y should take into account both the lattice matching degree of InP and InP, so 0.4

[0045]...

Embodiment 2

[0053] Put the InP substrate into the growth chamber of the MBE system, and the vacuum degree is required to be better than 1×10 -6 torr;

[0054] Heating the substrate to 500-700°C to remove the residual oxide layer on the surface of the substrate.

[0055] Lower the deoxidation temperature by 10-200°C to grow a layer of In that matches the InP substrate lattice. 0.52 Al 0.48 The As buffer layer has a thickness of 100-1000nm.

[0056] On the basis of the buffer layer, grow a layer of Al with a thickness of d1 x Ga 1-x As material, re-grow a layer of Al with a thickness of d2 x Ga 1-x Sb material, where:

[0057]

[0058] GR is the growth rate of the corresponding material. We can adjust the corresponding growth rate by adjusting the temperature of Al, Ga, As, Sb source.

[0059] For the control of the As component y,

[0060]

[0061] Thanks Al x Ga 1-x As y Sb 1-y To be used as the top section material, its forbidden band width is required to be greater t...

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Abstract

The invention belongs to the technical field of electronic component manufacturing and relates to a growing method of an Al-Ga-As-Sb four-component material. The growing method comprises the steps that an InP substrate is loaded into a growing chamber of an MBE system, heating is conducted to remove a residual oxidation layer on the surface of the substrate, a buffer layer matched with InP substrate lattices grows, an Al<x>Ga<1-x>As<y>Sb<1-y> top layer section unit constituted by two layers of ultrathin materials grows on the basis of the buffer layer, repeated growing is conducted for n cycles, and thus the Al-Ga-As-Sb four-component top layer section material with the precisely controlled components can be obtained. According to the process, through an As / Sb or Al / Ga paired control method, the double layers serve as one cycle to enable the Al-Ga-As-Sb four-component material to grow in a component-precise mode, competition between As and Sb or Al and Ga in the material growing process is effectively avoided, and limitation of immiscible gaps to material growing is thoroughly avoided.

Description

technical field [0001] The invention relates to the technical field of manufacturing electronic components, in particular to a growth method for an AlGaAsSb four-component material. Background technique [0002] As a representative of renewable energy, solar cells have attracted widespread attention. Most of the current commercial monocrystalline silicon, polycrystalline silicon, and thin-film solar cells adopt a single P-N junction structure, which can only absorb and convert a small part of the full spectrum of the solar energy spectrum, so the photoelectric conversion efficiency is generally not high (less than 30%). To further improve cell efficiency, we can turn our attention to multi-cell solar cells. Multi-cell solar cells, as the name suggests, the cell structure is sequentially provided with light-absorbing layers with band gaps from large to small, so as to realize the sequential absorption of the solar spectrum from short wavelengths to long wavelengths, thereby ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0304H01L31/18H01L21/02
CPCY02P70/50
Inventor 陈意桥张国祯
Owner SUZHOU KUNYUAN OPTOELECTRONICS CO LTD