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Etching control method and device for grating

A control method and grating technology, applied in the optical field, can solve the problems of inability to precisely control the etching process, difficult to ensure the accuracy of the etching depth, etc., and achieve the effect of improving the accuracy

Active Publication Date: 2022-07-05
北京至格科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In related technologies, when etching the grating, the etching process cannot be precisely controlled, and it is difficult to ensure the accuracy of the etching depth (grating groove depth)

Method used

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  • Etching control method and device for grating
  • Etching control method and device for grating
  • Etching control method and device for grating

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Embodiment Construction

[0067] Various exemplary embodiments, features and aspects of the present disclosure will be described in detail below with reference to the accompanying drawings. The same reference numbers in the figures denote elements with the same or similar function. While various aspects of the embodiments are shown in the drawings, the drawings are not necessarily drawn to scale unless otherwise indicated.

[0068]The word "exemplary" is used exclusively herein to mean "serving as an example, embodiment, or illustration." Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments.

[0069] In addition, in order to better illustrate the present disclosure, numerous specific details are given in the following detailed description. It will be understood by those skilled in the art that the present disclosure may be practiced without certain specific details. In some instances, methods, means, components and circ...

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Abstract

The present disclosure relates to a grating etching control method and device. The method includes: in the grating etching process, determining the diffraction efficiency of the grating to be etched in real time; judging whether the conditions for stopping the etching are satisfied according to the diffraction efficiency; when the conditions for stopping the etching are satisfied, controlling to stop the etching. In the embodiment of the present disclosure, during the grating etching process, the real-time diffraction efficiency of the grating to be etched is monitored, and when it is judged that the conditions for stopping the etching are satisfied according to the diffraction efficiency, the etching is controlled to stop, so as to realize the precise etching process. control, so that the accuracy of the etching depth can be effectively improved.

Description

technical field [0001] The present disclosure relates to the field of optics, and in particular, to a grating etching control method and device. Background technique [0002] Gratings are optical elements that disperse light by using the principle of multi-slit diffraction, and are widely used in the field of optics. In the related art, when etching a grating, it is impossible to precisely control the etching process, and it is difficult to ensure the accuracy of the etching depth (the depth of the grating groove). SUMMARY OF THE INVENTION [0003] In view of this, the present disclosure proposes a grating etching control method and device, which can realize precise control of the etching process, thereby effectively improving the accuracy of the etching depth. [0004] According to an aspect of the present disclosure, there is provided a method for controlling the etching of a grating, the method comprising: [0005] During the grating etching process, the diffraction e...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18
Inventor 曾理江李立峰
Owner 北京至格科技有限公司