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A preparation method of monodisperse ultra-small silica nanoparticles

An ultra-small silicon dioxide and nanoparticle technology, applied in the directions of silicon dioxide, silicon oxide, nanotechnology, etc., can solve the problems of high energy consumption, high reaction temperature, complex preparation process, etc., and achieve low energy consumption and simple preparation. , good dispersion effect

Active Publication Date: 2020-09-11
YANSHAN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, these methods have certain limitations, such as cumbersome operation, long reaction time, high reaction temperature, poor dispersion of silica, and difficulty in controlling the particle size, making the preparation cost high and difficult for large-scale production
[0004] Therefore, how to solve the problems of high cost, complicated preparation process, high energy consumption and low yield of preparing ultra-small silica in the prior art has become an important technical problem to be solved by those skilled in the art.

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  • A preparation method of monodisperse ultra-small silica nanoparticles
  • A preparation method of monodisperse ultra-small silica nanoparticles
  • A preparation method of monodisperse ultra-small silica nanoparticles

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preparation example Construction

[0028] The invention provides a method for preparing monodisperse ultra-small silica nanoparticles, comprising the following steps:

[0029] SiO 2 Spheres, water and protective agent mixed, for SiO 2 The ball is coated to obtain the coating mixture;

[0030] The coating mixture is mixed with an etchant, and an etching reaction is carried out under the condition of stirring at room temperature to obtain monodisperse ultra-small silicon dioxide nanoparticles.

[0031] SiO 2 Spheres, water and protective agent mixed, for SiO 2 The balls were coated to obtain a coating mix.

[0032] In the present invention, the SiO 2 The particle size of the spheres is preferably 50 nm to 2 μm, preferably 200 nm to 1 μm, most preferably 300 to 500 nm. The present invention to the SiO 2 There is no special requirement for the source of the ball, and commercially available products or well-known products known to those skilled in the art are used. can be synthesized.

[0033] Before mixin...

Embodiment 1

[0050] use Synthesized SiO with a particle size of 340nm 2 The ball, ethanol and water were alternately centrifuged and washed 6 times at 8000 rpm for 5 minutes, and dried in a vacuum oven at 80°C for 10 hours. Weigh 0.6 g of synthesized SiO 2 Sonicate the balls for 20min and disperse them in a beaker with 40mL of water, add 0.5g polyvinylpyrrolidone (PVP) as a protective agent, stir at room temperature for 3h at a speed of 300rpm, coat the surface of the silica nanospheres with PVP, and then add 0.20g NaOH was used as an etchant, reacted at room temperature for 10 hours, and the product was washed twice with ethanol and water alternately by centrifugation at 15,000 rpm for 10 minutes, and dried in a vacuum oven at 80°C for 10 hours to obtain monodisperse ultra-small silica nanoparticles .

[0051] SiO before coating 2 balls, coated SiO 2 After 5 hours of ball and etching reaction, SiO 2 The ball and the product after the etching reaction was carried out for 10h were ob...

Embodiment 2

[0053] use Synthesized SiO with a particle size of 340nm 2 Nanospheres, ethanol and water were alternately centrifuged and washed 6 times at 8000 rpm for 5 minutes, and dried in a vacuum oven at 80°C for 10 hours. Weigh 0.6 g of synthesized SiO 2 Nanospheres were dispersed in a beaker with 40mL of water by ultrasonication for 20min, and 0.5g of polyvinylpyrrolidone (PVP) was added as a protective agent, stirred at room temperature for 3h at a speed of 300rpm to coat the surface of silica nanospheres with PVP, and then added with 0.36 g NaOH was used as an etchant, reacted at room temperature for 5 hours, and the product was washed twice with ethanol and water alternately at 15,000 rpm for 10 minutes, and dried in a vacuum oven at 80°C for 10 hours to obtain silica nanoparticles.

[0054] The obtained silica nanoparticles were observed by transmission electron microscope, and the results were as follows: Figure 5 shown. Figure 5 It was shown that after etching with 0.36g...

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Abstract

The invention provides monodispersed subminiature silicon dioxide nanoparticles and a preparation method thereof and belongs to the technical field of silicon dioxide preparation. The preparation method includes following steps: mixing SiO2 balls, water and a protection agent, and coating the SiO2 balls to obtain a coated mixture; mixing the coated mixture with an etching agent, and allowing etching reaction while stirring at room temperature to obtain the monodispersed subminiature silicon dioxide nanoparticles. The preparation method is simple and low in energy consumption; the etching agentcan enter the inside of silicon dioxide during stirring at room temperature to form a non-hollow porous structure inside silicon dioxide, and the monodispersed subminiature silicon dioxide nanoparticles can be obtained after the structure collapses; the prepared silicon dioxide nanoparticles are high in dispersity.

Description

technical field [0001] The invention relates to the technical field of silica preparation, in particular to monodisperse ultra-small silica nanoparticles and a preparation method thereof. Background technique [0002] Due to its small particle size, silica nanoparticles have large specific surface area, strong surface adsorption, large surface energy, good dispersion, easy surface modification, and good optical transparency. Due to its superior stability, thickening and thixotropy, nano-silica is widely used in various fields as additives, catalyst carriers, decolorizers, matting agents, plastic fillers, polishing agents, cosmetics and pharmaceutical carriers, etc. Among them, ultra-small silica particles have obvious advantages compared with large-sized silica. For example, in the field of medicine, drugs loaded with smaller silica can enter cells more easily, which improves the utilization of drugs; in the field of materials , adding smaller silica into the epoxy resin, d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/18B82Y40/00
CPCB82Y40/00C01B33/18C01P2004/52C01P2004/64
Inventor 王海燕杜大学曾玉莲刘珊段晓雅王健王晨博王凤彦徐朝鹏
Owner YANSHAN UNIV