Method and apparatus for supplying water of specified concentration
A technology that specifies the concentration and supply device, and is applied in the direction of feeding device, mixing method, chemical instrument and method, etc., and can solve problems such as unrealistic
Pending Publication Date: 2019-08-23
KURITA WATER INDUSTRIES LTD
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Problems solved by technology
[0009] There is also a simple method that gives priority to liquid quality stabilization, prepares dilute wash water under predetermined conditions in advance, stores it, and continuously supplies it from the storage tank, but in this case, it is necessary to install a large-scale water storage tank for wafer manufacturing. near the washing machine in the clean room, so it is impractical
Method used
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Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
[0039] figure 1 In the system, ultrapure water was injected under the following conditions. The results are shown in Table 1.
[0040] Ultrapure water delivery volume: 12~20L / min
[0041] Liquid 1: NH 4 OH 10ppm aqueous solution
[0042] Liquid 2: H 2 o 2 1ppm dissolved water
[0043] Control mode of pump 8: PID
[0044] Test time: 20 minutes
Embodiment 2
[0046] Such as figure 2 Injection was performed under the same conditions as in Example 1 except that the weight sensor 20 was used instead of the cumulative flow meters 4 and 5 . The results are shown in Table 1.
Embodiment 3
[0048] Pump 8 was omitted and the image 3 Injection was performed under the same conditions as in Example 1 except for the inert gas pressure-feeding system. The results are shown in Table 1.
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Abstract
Provided is a method for supplying water of specified concentration, the method comprising a step for adding, to ultrapure water, at least two kinds of liquids, that is, a first liquid which is a conductive liquid and a second liquid which is a nonconductive liquid, to produce water of specified concentration containing a first liquid component and a second liquid component of specified concentrations, wherein a mixed liquid in which the first liquid and the second liquid have been mixed in advance at a specified mixing ratio is prepared, and the mixed liquid is added to the ultrapure water such that the electric conductivity or resistivity of the ultrapure water after the addition has a specified value. An apparatus for implementing the method is also provided.
Description
technical field [0001] The present invention relates to a method and an apparatus for supplying water of a predetermined concentration, and particularly relates to preparing and supplying a predetermined concentration of water of a predetermined concentration by mixing a conductive first liquid and a non-conductive second liquid and adding them to ultrapure water Water supply method and device. [0002] More specifically, the present invention relates to a method and an apparatus suitable for supplying washing water which is effective in washing and rinse processes of wafers for semiconductors and contains very low concentrations of solutes such as alkalis and oxidants. Background technique [0003] In washing and cleaning processes of silicon wafers for semiconductors, etc., water in which solutes effective in controlling pH and redox potential are dissolved at very low concentrations (herein referred to as dilute washing water) may be used. Ultrapure water is used as the ...
Claims
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IPC IPC(8): B01F3/08B01F15/04B01J4/02H01L21/304
CPCB01J4/02H01L21/304G05D11/139B01F23/451B01F25/311B01F33/834B01F35/2111B01F35/2112B01F35/2117B01F35/2202B01F35/2132B01F35/71745B01F35/7176B01F35/831B01F35/82B01F2101/58B01F2101/305B01F23/40B01F35/80B01F23/405B01F25/30B01F33/80B01F35/22141B01F23/483
Inventor 饭野秀章
Owner KURITA WATER INDUSTRIES LTD
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