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Control device for actuating an actuation unit of a lithographic apparatus, a lithographic apparatus having a control device, and a method of operating a control device

A control device, a technology for lithography equipment, applied in microlithography exposure equipment, optomechanical equipment, photolithography process exposure equipment and other directions, can solve problems such as adverse effects of operation, achieve high power efficiency, promote low electromagnetic emission, low heat input effect

Active Publication Date: 2021-11-16
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Ripple currents can also occur within switching amplifiers, which can also adversely affect operation

Method used

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  • Control device for actuating an actuation unit of a lithographic apparatus, a lithographic apparatus having a control device, and a method of operating a control device
  • Control device for actuating an actuation unit of a lithographic apparatus, a lithographic apparatus having a control device, and a method of operating a control device
  • Control device for actuating an actuation unit of a lithographic apparatus, a lithographic apparatus having a control device, and a method of operating a control device

Examples

Experimental program
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Embodiment Construction

[0093] Figure 1a A schematic view of an EUV lithographic apparatus 100A comprising a beam shaping and illumination system 102 and a projection system 104 is shown. In this case, EUV stands for "Extreme Ultraviolet" (EUV) and denotes the wavelength of the working light (also called the radiation used) between 0.1 and 30 nm. The beam shaping and illumination system 102 and the projection system 104 are arranged in a vacuum In the housing 101. The vacuum housing 101 is evacuated by means of a vacuuming device (not shown).

[0094] The EUV lithographic apparatus 100A includes an EUV light source 106A. A plasma source (or synchrotron) can be provided eg as EUV light source 106A, which plasma source emits radiation 108A in the EUV range (in the extreme ultraviolet range, ie eg in the wavelength range of 0.1 nm to 30 nm). In the beam shaping and illumination system 102, the EUV radiation 108A is focused and the desired operating wavelength is filtered out of the EUV radiation 108A....

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Abstract

The invention relates to a control device (10) for actuating an actuator unit (11) to set the position (P) of an optical element (20) of a lithographic apparatus (100A, 100B), said control device having : amplifier unit (30), providing the control signal (40) of the actuator unit (11) via a voltage signal (41) and a PWM signal (42), wherein the PWM signal (42) has a duty cycle (43) and a clock frequency (51); and a modulator unit (50) designed to provide a PWM signal (42) with a duty cycle (43) and a defined clock frequency (51) from a plurality of defined clock frequencies (52), wherein more The defined clock frequency (51) of the defined clock frequencies (52) is the base clock frequency (f 0 ), where the base clock frequency (f 0 ) is in the range 10kHz-1MHz and integer multiples are defined as multiplying by the factor n.

Description

technical field [0001] The invention relates to a control arrangement for actuating an actuation unit of a lithographic apparatus, to a lithographic apparatus comprising such a control arrangement, and to a method of operating such a control arrangement. [0002] The priority application DE 10 2016 226 082.0 is hereby incorporated by reference in its entirety. Background technique [0003] As an example, lithographic equipment is used in the manufacture of integrated circuits, or ICs, to image a mask pattern in a mask onto a substrate such as a silicon wafer. In doing so, the light beam generated by the optical system is directed through the mask onto the substrate. [0004] In this case, the representable feature size depends largely on the wavelength of light used. In order to achieve particularly small structures, it is desirable to use radiation of particularly short wavelengths. EUV lithographic equipment uses light with wavelengths in the range of 5nm to 30nm, espec...

Claims

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Application Information

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IPC IPC(8): G03F7/20H03K7/08G02B7/182H01L41/04H01L41/09
CPCG02B7/1828G03F7/70258H03K7/08G03F7/70758H01L21/027G03F7/70891G03F7/70575H03K3/017H10N30/20H10N30/80H10N30/802
Inventor S.克朗L.伯杰R.基塞尔P.威杰拉尔斯
Owner CARL ZEISS SMT GMBH