High-stability chemical nickel plating liquid and preparation method thereof
An electroless nickel plating solution with high stability technology, applied in the field of electroless plating, can solve the problems of high difficulty in long-life plating solution research, deposition speed drop, etc., and achieve the effects of low cost, improved porosity, and enhanced stability
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[0067] As an embodiment, the preparation method of described electroless nickel plating solution, comprises the following steps:
[0068] (1) Adding deionized water with a fraction of 50% of the pre-configured plating solution at room temperature;
[0069] (2) Then add complexing agent, nickel salt, buffering agent and stir until all dissolve under stirring situation,
[0070] (3) Add the remaining ionized water, then add reducing agent, stabilizer and auxiliary agent and stir until they are completely dissolved; then adjust the pH value to 4.1-5.0 with sulfuric acid, and the product is obtained.
[0071] The stirring speed is 500-1500rpm.
[0072] The third aspect of the present invention provides a nickel-plated product prepared by immersing the workpiece to be plated in the nickel-plating solution to form a plated film.
[0073] The workpieces to be plated include but are not limited to: PCB circuit boards, alumina ceramic substrates, aluminum nitride ceramic substrates, ...
Embodiment 1
[0079] A high-stability electroless nickel plating solution, comprising the following components: complexing agent 12g / L, nickel salt 18g / L, reducing agent 30g / L, buffering agent 1g / L, stabilizer 8ppm, auxiliary agent 80ppm .
[0080] The complexing agent is oxalic acid, citric acid, and propionic acid, and the concentration ratio of the oxalic acid, citric acid, and propionic acid is: 1:1:4;
[0081] Described nickel salt is nickel acetate;
[0082] The reducing agent is sodium hypophosphite;
[0083] The buffering agent is sodium acetate and acetic acid, and the concentration ratio of the sodium acetate and acetic acid is 1:1.
[0084] The stabilizer is isothiuride propanesulfonic acid inner salt, and the isothiuride propanesulfonic acid inner salt was purchased from Hubei Youshida Technology Co., Ltd.
[0085] The auxiliary agent is sodium lauryl sulfate.
[0086] The preparation method of described electroless nickel plating solution, comprises the following steps:
...
Embodiment 2
[0092] A high-stability electroless nickel plating solution, comprising the following components: complexing agent 30g / L, nickel salt 30g / L, reducing agent 40g / L, buffering agent 4g / L, stabilizer 18ppm, auxiliary agent 120ppm .
[0093] The complexing agent is oxalic acid, citric acid, and propionic acid, and the concentration ratio of the oxalic acid, citric acid, and propionic acid is: 1:1:4;
[0094] Described nickel salt is nickel acetate;
[0095] The reducing agent is sodium hypophosphite;
[0096] The buffering agent is sodium acetate and acetic acid, and the concentration ratio of the sodium acetate and acetic acid is 1:1.
[0097] The stabilizer is isothiuride propanesulfonic acid inner salt, and the isothiuride propanesulfonic acid inner salt was purchased from Hubei Youshida Technology Co., Ltd.
[0098] The auxiliary agent is sodium lauryl sulfate.
[0099] The preparation method of described electroless nickel plating solution, concrete steps are with embodime...
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