Pedestal assemblies for plasma processing equipment
A technology for processing equipment and plasma, which is used in semiconductor/solid-state device manufacturing, electrical components, discharge tubes, etc., and can solve problems such as the adverse effects of eccentric thermal expansion of focus rings, the existence of arcs, and the reduction of processing uniformity.
Active Publication Date: 2022-03-11
베이징이타운세미컨덕터테크놀로지컴퍼니리미티드 +1
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Problems solved by technology
Off-center thermal expansion of the focus ring can adversely affect during processing of substrates (e.g., semiconductor wafers)
For example, the uniformity of the process may be reduced due to non-uniform electric fields at the edges of the substrate
In some cases, there is an increased likelihood of arcing in areas where the gap between the focus ring and the substrate increases
Method used
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[0020] Reference will now be made in detail to embodiments of the invention, one or more examples of which are illustrated in the accompanying drawings. Each example is provided by way of explanation of the invention, not limitation of the invention. In fact, it will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the scope or spirit of the invention. For example, features illustrated or described as part of one embodiment can be used with another embodiment to yield a still further embodiment. Thus, it is intended that the present invention covers the modifications and variations that come within the scope of the appended claims and their equivalents.
[0021] Exemplary aspects of the present disclosure relate to pedestal assemblies for use with pedestal supports in processing apparatus, such as plasma processing apparatus. A plasma processing apparatus may include a processing cha...
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A base assembly for a processing apparatus, such as a plasma processing apparatus, is provided. In one exemplary embodiment, a plasma processing apparatus may include a processing chamber having a processing chamber interior. The apparatus can include a plasma source configured to induce a plasma within the interior of the processing chamber. The apparatus may include a pedestal configured to support a substrate within the interior of the processing chamber during processing of the substrate. The apparatus may include a focus ring configured to be disposed about a periphery of the substrate when the substrate is supported on the susceptor. The focus ring may have a plurality of evenly spaced slots. Each slot can be configured to engage a corresponding protrusion on the base.
Description
[0001] priority [0002] This application claims priority to U.S. Provisional Application Serial No. 62 / 479,483, filed March 31, 2017, entitled "Susceptor Assembly for a Plasma Processing Apparatus," which is incorporated herein by reference for all purposes . technical field [0003] The present disclosure generally relates to susceptor substrate supports in processing equipment, such as plasma processing equipment. Background technique [0004] Plasma processing tools may be used in the fabrication of devices such as integrated circuits, micromechanical devices, flat panel displays, and other devices. Plasma processing tools for modern plasma etch applications may need to provide high plasma uniformity and multiple plasma controls, including independent control of plasma profile, plasma density, and ion energy. In some cases, plasma processing tools may need to maintain a stable plasma under various process gases and under various conditions (eg, gas flow, gas pressure, ...
Claims
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IPC IPC(8): H01J37/32
CPCH01L21/68735H01J37/32642H01J37/32091H01J37/3211H01J37/32449H01J37/32651H01J37/32715H01J2237/334H01L21/67063H01L21/6831
Inventor M·L·祖克T·F·王
Owner 베이징이타운세미컨덕터테크놀로지컴퍼니리미티드