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System and process for treating hydrogen chloride generated by hydrolysis of chlorosilane

A treatment system and chlorosilane technology, applied in the field of chemical technology, can solve problems such as failure to solve the environmental problems of hydrochloric acid treatment of silicon-containing impurities

Active Publication Date: 2019-11-19
ZHEJIANG XINAN CHEM INDAL GROUP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although this method can purify hydrogen chloride to a certain extent, it still produces a large amount of saturated hydrochloric acid containing siloxane in the process of washing with saturated concentrated hydrochloric acid, which fails to solve the environmental problem of the treatment of silicon-containing impurity hydrochloric acid.

Method used

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  • System and process for treating hydrogen chloride generated by hydrolysis of chlorosilane
  • System and process for treating hydrogen chloride generated by hydrolysis of chlorosilane
  • System and process for treating hydrogen chloride generated by hydrolysis of chlorosilane

Examples

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Embodiment 1

[0048] Embodiment 1, the present invention handles the system of hydrogen chloride produced by the hydrolysis of chlorosilane

[0049] The system for treating hydrogen chloride produced by the hydrolysis of chlorosilanes in this embodiment includes a pretreatment system 1 and a separation system 2 . The pretreatment system 1 includes a washing unit 11 and a repurification unit 12 , one end of the washing unit 11 is connected to the repurification unit 12 , and the other end is connected to the separation system 2 . The washing unit 11 includes a washing tower, which is a single-stage spraying tower. The re-purification unit 12 includes a flocculator 121 and a separator 122, the flocculator 121 is a flocculation tank added with a flocculant, and the separator 122 adopts a multi-layer membrane tubular filter. One end of the flocculator 121 is connected to the separator 122 , and one end of the separator 122 is connected to the washing unit 11 . The separation system 2 is a gla...

Embodiment 2

[0050] Embodiment 2, the present invention handles the system of hydrogen chloride produced by the hydrolysis of chlorosilane

[0051] The system for treating hydrogen chloride produced by the hydrolysis of chlorosilanes in this embodiment includes a pretreatment system 1 and a separation system 2 . The pretreatment system 1 includes a washing unit 11 and a repurification unit 12 , one end of the washing unit 11 is connected to the repurification unit 12 , and the other end is connected to the separation system 2 . The washing unit 11 includes a washing tower, the washing tower is a two-stage washing tower, where N≥2, and the washing tower is a packed tower. The re-purification unit 12 includes a flocculator 121 and a separator 122, the flocculator 121 is a flocculation tank added with a flocculant, and the separator 122 is a centrifugal separator. One end of the flocculator 121 is connected to the separator 122 , and one end of the separator 122 is connected to the washing u...

Embodiment 3

[0052] Embodiment 3, the present invention handles the system of hydrogen chloride produced by the hydrolysis of chlorosilane

[0053] The system for treating hydrogen chloride produced by the hydrolysis of chlorosilanes in this embodiment includes a pretreatment system 1 and a separation system 2 . The pretreatment system 1 includes a washing unit 11 and a repurification unit 12 , one end of the washing unit 11 is connected to the repurification unit 12 , and the other end is connected to the separation system 2 . The washing unit 11 includes a washing tower, which is a three-stage spraying tower. The re-purification unit 12 includes a flocculator 121 and a separator 122, the flocculator 121 is a flocculation tank added with a flocculant, and the separator 122 adopts a sedimentation method for separation. One end of the flocculator 121 is connected to the separator 122 , and one end of the separator 122 is connected to the washing unit 11 . The separation system 2 is a glas...

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Abstract

The invention belongs to the technical field of chemical processes, and specifically relates to a system and a process for treating hydrogen chloride generated by hydrolysis of chlorosilane. The treatment system provided by the invention comprises a pretreatment system and a separation system, wherein the pretreatment system comprises a washing unit and a re-purification unit; one end of the washing unit is connected with the re-purification unit; and the other end of the washing unit is connected with the separation system. Hydrogen chloride gas generated after hydrolysis of chlorosilane firstly enters the washing unit; supercooled saturated concentrated hydrochloric acid is sprayed into the washing unit from the top of the washing unit for washing of the hydrogen chloride gas; then the washed and purified hydrogen chloride gas is allowed to enter the separation system from the upper part of the washing unit; a supercooled saturated concentrated hydrochloric acid product for washing is allowed to flow out of the washing unit and to enter the re-purification unit for purification so as to obtain impurity-removed concentrated hydrochloric acid; and the impurity-removed concentratedhydrochloric acid is allowed to enter the washing unit again for circularly washing hydrogen chloride generated by hydrolysis of chlorosilane. Compared with the prior art, the treatment system provided by the invention has the advantages of no generation of new wastewater in the whole technological process, and better environmental protection performance.

Description

technical field [0001] The invention relates to the technical field of chemical technology, in particular to a system and technology for treating hydrogen chloride produced by hydrolysis of chlorosilane. Background technique [0002] During the hydrolysis of organochlorosilanes, especially dimethyldichlorosilane, a large amount of hydrogen chloride gas will be produced, which will become by-product hydrochloric acid after being absorbed by water. This part of hydrochloric acid contains a certain amount of organosilicon impurities, which brings difficulties to subsequent utilization. Under conventional hydrolysis process conditions, the generated hydrogen chloride gas generally contains about 500-1000 mg / m of siloxane impurities 3 . Under acidic conditions, these impurities are prone to condensation reactions. As time goes on, short-chain siloxanes polymerize into long chains, and even cross-linking reactions occur, and the formed jelly is easy to stick to the wall, and ev...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/07B01D53/18B01D53/14B01D46/54B01D46/00
CPCB01D46/0036B01D46/543B01D53/1456B01D53/18C01B7/0706
Inventor 周曙光秦龙李培国余神銮姜胜宝詹波叶志凤
Owner ZHEJIANG XINAN CHEM INDAL GROUP