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A control device and method for controlling source bottle pressure

A control device and control source technology, applied in chemical instruments and methods, semiconductor/solid-state device manufacturing, polycrystalline material growth, etc., can solve problems such as difficult process adjustment, large fluctuations, and volatilization speed changes, and achieve precise control Concentration and nitrogen usage, enhanced control and adjustment capabilities, and the effect of stabilizing volatile concentration

Active Publication Date: 2021-09-17
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the new generation of low-pressure diffusion furnaces work in a vacuum environment during the process. It is difficult to control the pressure in the source bottle with the existing technology, which will easily cause the pressure in the source bottle to change with the pressure of the quartz reaction chamber, and the volatilization of the liquid source will also follow. In the end, it is difficult to control the total amount of liquid source used, resulting in poor consistency of the diffusion process and affecting batch quality
[0004] The final usage of the liquid source is directly related to the source temperature, the amount of nitrogen carried, the surface pressure of the source liquid level, and the source time. Since the existing technology cannot control the pressure in the source bottle, the pressure in the source bottle will vary with the pressure in the quartz reaction chamber. Fluctuation, especially under low-pressure diffusion conditions, the pressure of the quartz reaction chamber varies according to the process, and the fluctuation is large, and the volatilization rate of the source changes frequently, resulting in poor consistency of the diffusion process and very difficult process adjustment

Method used

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  • A control device and method for controlling source bottle pressure
  • A control device and method for controlling source bottle pressure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] figure 1 Shows a schematic configuration of a control apparatus controlling the pressure source in the embodiment of the bottle of the present invention.

[0038] like figure 1 , An embodiment of the present invention to provide a bottle of control pressure control apparatus comprising:

[0039] A reaction chamber; conduit for the reaction gas into the chamber 1 through the gas 12 and the gas line is provided with a first gas mass flow controller 6 12, the source bottles 3; wherein the feed source of the bottle 3 air inlet provided with a pressure sensor 8, a gas outlet into a gas into the reaction chamber through a gas line; the actual pressure sensor 8 for detecting a pressure value in the source bottles 3; regulate the line pressure, the line pressure regulating end gas line 12 is connected to the inlet end, the other end of the gas line 12 near the end of the reaction chamber 1 is connected to the pressure regulator pipeline provided with a second gas mass flow control...

Embodiment 2

[0051] figure 1 The present invention shows a schematic configuration of the control device controls the source of pressure bottle in this embodiment, figure 2 The present invention shows a flowchart illustrating a control method of a source of pressure bottles embodiment.

[0052] like figure 1 with figure 2 , According to another embodiment of the invention, there is provided a method for controlling the source of pressure bottles, comprising:

[0053] Step S1, the control 11 is adjusted by a set amount of a second gas mass flow controller via the pressure conduit into the reaction chamber 1, the pressure regulator flow line is stabilized, and a reaction chamber pressure of the stabilized 1, to prevent the source bottle 3 the pressure inside the reaction chamber 1 with pressure fluctuations, to avoid large fluctuations in the third pressure source bottle evaporation rate resulting in frequent changes of the source, diffusion process consistency.

[0054] In one example, when th...

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Abstract

The invention discloses a control device and method for controlling the pressure of a source bottle of a low-pressure diffusion furnace. The device comprises: a reaction chamber; a gas pipeline for feeding gas into the reaction chamber; There is a pressure sensor, the gas outlet passes gas into the reaction chamber through the gas pipeline; the pressure sensor is used to detect the actual pressure value in the source bottle; the pressure regulating pipeline, one end of the pressure regulating pipeline is connected to the inlet end of the gas pipeline , the other end is connected to the end of the gas pipeline close to the reaction chamber, and a second gas mass flow controller is arranged on the pressure regulating pipeline; the controller controls the The flow setting value of the second gas mass flow controller of the pressure regulating pipeline controls the actual pressure value of the source bottle within the range required by the pressure setting value of the source bottle, realizes the pressure control in the source bottle, and precisely controls the volatilization source concentration and nitrogen usage.

Description

Technical field [0001] Technical Field The present invention relates to a diffusion source bottle unit, in particular, relates to a control apparatus and method for controlling the source of pressure bottles. Background technique [0002] Horizontal heat diffusion furnace process is a crystalline silicon solar cell device manufacturing industry large scale use, for doping p-n junction, oxidation and annealing a silicon wafer. In the field of manufacturing solar cells, a liquid primary or phosphorus oxychloride as a diffusion source of boron tribromide, using nitrogen bubbling carried manner into the quartz reaction chamber carrying a chemical reaction chamber. [0003] Atmospheric closed tube currently used diffusion furnace, because of its work in the vicinity of atmospheric pressure, outlet pressure source bottle better consistency, no pressure liquid source bubbling bottle control. However, a new generation of low-pressure diffusion furnace during the working process in a vacu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B31/18C30B31/16C30B29/06H01L21/18H01L21/67
CPCC30B29/06C30B31/165C30B31/18H01L21/67098H01L31/1876
Inventor 孙朋涛李补忠郑建宇耿丹桂晓波
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD