Asymmetric thinning processing method for TFT-LCD (Thin Film Transistor Liquid Crystal Display) glass substrate
A processing method and asymmetric technology, which are applied in the field of asymmetric thinning processing of TFT-LCD glass substrates, and can solve the problems of decreased strength and insufficient pressure resistance of panels.
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Embodiment 1
[0029] A kind of TFT-LCD substrate glass asymmetric thinning processing method, this method comprises the following steps:
[0030] (1) Use acetone and ethanol to clean the appearance of the TFT-LCD substrate glass behind the box; wherein, the thickness of the array substrate is 0.5mm, and the thickness of the color filter substrate is 0.45mm;
[0031] (2) Immerse the cleaned TFT-LCD substrate glass vertically and constant temperature in the thinning etching solution at 49°C, and perform thinning treatment on the glass; the thinning time is 2.3h; the hydrogen ion concentration of the thinning etching solution is 2.9 mol / L.
[0032] (3) Take out the thinned TFT-LCD substrate glass and rinse it with clear water;
[0033] (4) Grinding and polishing the rinsed TFT-LCD substrate glass on both sides, then rinsing and drying with clean water; finally obtaining an array substrate and a color filter substrate with a thickness of 0.28mm.
[0034] Wherein, the thinning etching solution...
Embodiment 2
[0036] A kind of TFT-LCD substrate glass asymmetric thinning processing method, this method comprises the following steps:
[0037] (1) Use acetone and ethanol to clean the appearance of the TFT-LCD substrate glass behind the box; wherein, the thickness of the array substrate is 0.6mm, and the thickness of the color filter substrate is 0.49mm;
[0038] (2) Immerse the cleaned TFT-LCD substrate glass vertically and constant temperature in the thinning etching solution at 50°C, and carry out thinning treatment on the glass; the thinning time is 3.1h; the hydrogen ion concentration of the thinning etching solution is 3.1 mol / L.
[0039] (3) Take out the thinned TFT-LCD substrate glass and rinse it with clear water;
[0040] (4) Grinding and polishing the rinsed TFT-LCD substrate glass on both sides, then rinsing and drying with clean water; finally obtaining an array substrate and a color filter substrate with a thickness of 0.31 mm.
[0041] Wherein, the thinning etching solut...
Embodiment 3
[0043] A kind of TFT-LCD substrate glass asymmetric thinning processing method, this method comprises the following steps:
[0044] (1) Use acetone and ethanol to clean the appearance of the TFT-LCD substrate glass behind the box; wherein, the thickness of the array substrate is 0.65mm, and the thickness of the color filter substrate is 0.5mm;
[0045] (2) Immerse the cleaned TFT-LCD substrate glass vertically and constant temperature in the thinning etching solution at 51°C, and carry out thinning treatment on the glass; the thinning time is 2.7h; the hydrogen ion concentration of the thinning etching solution is 3.5 mol / L.
[0046] (3) Take out the thinned TFT-LCD substrate glass and rinse it with clear water;
[0047] (4) Perform double-sided grinding and polishing on the washed TFT-LCD substrate glass, and then rinse and dry with clean water; finally obtain an array substrate and a color filter substrate with a thickness of 0.35 mm.
[0048] Wherein, the thinning etching s...
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