High-temperature Hall sensor integrating rear vertical type and front horizontal type three-dimensional magnetic field detection function and manufacturing method thereof
A technology of Hall sensor and three-dimensional magnetic field, which is applied in the manufacture/processing of Hall effect devices, devices applying electro-magnetic effects, and electromagnetic devices, and can solve the problem of reducing the current and voltage of vertical Hall sensors and limiting miniature And problems such as the new application of nano-Hall sensors and the reduction of sensor sensitivity, etc., to achieve the effect of small size, small channel electron binding, and large band gap
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Embodiment 1
[0034] The application of the present invention proposes a technical scheme of a three-dimensional Hall sensor with a completely wide bandgap material suitable for high-temperature working environments that integrates a SiC vertical Hall sensor on the back and a GaN heterojunction horizontal Hall sensor on the front. Such as figure 1 As shown in the figure above, it is a schematic diagram of the front structure of the device structure. The GaN heterojunction structure is used to make a cross horizontal Hall sensor, which is used to sense the magnetic field perpendicular to the surface of the device. The electrodes C3 and C4 are signal input terminals, which can input current or voltage, and measure the potential difference between the electrodes S3 and S4. It is also possible to use the electrodes S3 and S4 as signal input terminals to input current or voltage, and measure the potential difference between the electrodes C3 and C4. The GaN heterojunction structure effectively...
Embodiment 2
[0047] The production process of the specific embodiment of the application target device of the present invention is described as follows:
[0048] 1) Substrate preparation: prepare the SiC material substrate, clean the substrate material, and remove pollutants on the surface of the SiC substrate.
[0049] 2) Epitaxial growth: AlGaN / GaN heterojunction structure and buffer layer AlN are epitaxially grown by metal-organic compound chemical vapor deposition, and the resulting GaN epitaxial layer is unintentionally doped, with a thickness of 10 μm and a background electron concentration of less than 3×10 16 cm -3 , the thickness of the AlGaN barrier layer on the epitaxial layer is 25nm, and the Al composition is 0.25. The buffer layer is AlN with a thickness of 50nm.
[0050] 3) Mesa etching: the epitaxially grown samples are coated with glue (use AZ6130 positive photoresist), uniform glue (forward rotation 600rpm-3s, back rotation 1000rpm-20s, the final thickness of photoresis...
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