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Mask plate and manufacturing method thereof

A manufacturing method and a technology of a mask, which are applied in the photoplate making process, optics, instruments, etc. of the pattern surface, can solve the problems of early scrapping of cleaning and repeated repair of the mask, so as to improve production efficiency and product yield rate, Anti-scratch, easy-to-clean effect

Active Publication Date: 2020-03-27
深圳市龙图光罩股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem mainly solved by the invention is to avoid the problems of repeated repair, cleaning and even early scrapping of the mask during use.

Method used

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  • Mask plate and manufacturing method thereof
  • Mask plate and manufacturing method thereof
  • Mask plate and manufacturing method thereof

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Embodiment Construction

[0019] The present invention will be further described in detail below through specific embodiments in conjunction with the accompanying drawings. Wherein, similar elements in different implementations adopt associated similar element numbers. In the following implementation manners, many details are described for better understanding of the present application. However, those skilled in the art can readily recognize that some of the features can be omitted in different situations, or can be replaced by other elements, materials, and methods. In some cases, some operations related to the application are not shown or described in the description, this is to avoid the core part of the application being overwhelmed by too many descriptions, and for those skilled in the art, it is necessary to describe these operations in detail Relevant operations are not necessary, and they can fully understand the relevant operations according to the description in the specification and genera...

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Abstract

The invention relates to a mask plate and a manufacturing method thereof. The mask plate comprises a substrate, a graphical light blocking layer and a first coating, wherein the substrate is made of alight transmitting material; the first coating is formed on part of the surface of the substrate and the surface of the graphical light blocking layer; and the first coating has light transmission, and the material of the first coating contains a fluorocarbon group. As the first coating is formed on the surface of the light blocking layer and the first coating material contains a fluorine-carbongroup, fluorocarbon groups in the material can provide very low surface tension / activity for the surface of the mask plate, and the tolerance to organic solvents such as acetone and alcohol can be improved; and meanwhile, due to the first coating, the formed mask plate can prevent adhesion of photoresist and dust particles, is resistant to scratching and easy to clean, so that the problems of repeated repair, cleaning, even advanced scrapping and the like of the mask plate in the using process are reduced, and the production efficiency and the product yield are improved.

Description

technical field [0001] The invention relates to the field of mask plate manufacturing, in particular to a mask plate and a manufacturing method thereof. Background technique [0002] The mask plate is composed of a metal layer film or a light-blocking layer film and a substrate on which information such as graphics and characters are recorded on the surface. [0003] Traditional masks are mainly used in TP (Touch Panel, touch screen), LCD (Liquid Crystal Display, liquid crystal display), FPC (Flexible Printed Circuit, flexible printed circuit), etc., and the exposure method uses the mask as an optical mold. Contact exposure, vacuum adsorption exposure and other methods copy the graphic information on the mask plate to its front-end products. During the use of masks, there will be a series of technical problems, such as: mask scratches, dirt, etc., resulting in frequent rework, cleaning and maintenance of masks, seriously affecting production efficiency and product yield . ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/76G03F1/82G03F1/68
CPCG03F1/68G03F1/76G03F1/82
Inventor 侯广杰谢超
Owner 深圳市龙图光罩股份有限公司