Surface treatment method for improving corrosion resistance and anti-icing performance of titanium alloy surface
A surface treatment, titanium alloy technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of difficult construction of surface micro-rough structure, poor bonding force of alloy layer, etc., to avoid homotropy The effect of structural transformation, reduction of working temperature, and improvement of anti-icing ability
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Embodiment 1
[0055] Embodiment 1: alloy material preparation
[0056] (1) Before installing the Ni-Cu-Y target, polish it with 1# sandpaper to remove the oxide layer, clean it ultrasonically in absolute ethanol and dry it;
[0057] (2) The base material is cast TC4 alloy. Using wire electric discharge cutting technology, the base is made into a sample with a size of 15mm×15mm×4mm, and then coded as 0#, 01#, 03#, 05#, 07# After sanding, polish with 2.5 μm diamond paste. After ultrasonic cleaning with acetone solution, dry for later use;
[0058] (3) A plasma etching system is used to carry out ion etching with argon gas to construct a large number of defective alloy surfaces. The etching process parameters are as follows: power 2000W, argon gas flow rate 12mL / min, pressure 10KPa, time 1h;
[0059] (4) Using the double-glow plasma surface metallurgy method, put the TC4 alloy and Ni-Cu-Y alloy target into the double-glow plasma surface alloying device, use the titanium alloy as the workpiec...
Embodiment 2
[0065] Embodiment 2: alloy material preparation
[0066] (1) Before installing the Ni-Cu-Y target, polish it with 1# sandpaper to remove the oxide layer, clean it ultrasonically in absolute ethanol and dry it;
[0067] (2) The base material is cast TC18 alloy. Using wire electric discharge cutting technology, the base is made into a sample with a size of 15mm×15mm×4mm, and then coded as 0#, 01#, 03#, 05#, 07# After grinding with sandpaper, polish with 2.5 μm diamond abrasive paste, ultrasonically clean with acetone solution, and dry for later use;
[0068] (3) A plasma etching system is used to carry out ion etching with argon gas to construct a large number of defective alloy surfaces. The etching process parameters are as follows: power 2000W, argon gas flow rate 15mL / min, pressure 12KPa, time 0.7h;
[0069] (4) Using the double-glow plasma surface metallurgy method, put the titanium alloy and Ni-Cu-Y alloy target into the double-glow plasma surface alloying device, use the...
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