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A method for forming a film of barium strontium titanate on a lithium niobate substrate based on magnetron sputtering

A technology of barium strontium titanate and magnetron sputtering, applied in sputtering coating, metal material coating process, vacuum evaporation coating, etc. Simplified steps, cost savings, good crystallization results

Active Publication Date: 2021-09-28
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, when sputtering barium strontium titanate thin films on lithium niobate substrates, it is difficult to crystallize barium strontium titanate films directly on lithium niobate substrates due to the problems of lattice mismatch and large difference in thermal expansion coefficients. Few relevant reports

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  • A method for forming a film of barium strontium titanate on a lithium niobate substrate based on magnetron sputtering

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Embodiment 1

[0028] A method for forming a strontium barium titanate film on a lithium niobate substrate based on magnetron sputtering, specifically comprising the following steps:

[0029] Step 10: move the lithium niobate substrate to be sputtered into the vacuum chamber and place it on the sample holder;

[0030] Step 20: Adjust the angle of the target in the vacuum chamber to a preset angle, and adjust the distance between the target and the substrate to a preset distance, wherein the distance between the silica targets is 140 mm, the distance between the titanium targets is 60 mm, and the distance between the platinum targets is 60 mm. The barium strontium titanate target spacing is 90mm. ;

[0031] Step 30: Vacuumize the vacuum chamber to a background vacuum of 6x10 -5 Pa;

[0032] Step 40: The silicon dioxide target as a non-metallic target needs to be pre-sputtered for 10 minutes at a power of 60W. The sample baffle needs to be closed for pre-sputtering, and the sample baffle i...

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Abstract

The invention belongs to the technical field of thin film preparation, and in particular relates to a method for forming strontium barium titanate film on a lithium niobate substrate based on magnetron sputtering. The method includes the following steps: moving the lithium niobate substrate to be sputtered into the vacuum chamber and placing it on the sample holder; adjusting the angle of the target in the vacuum chamber to a preset angle, and adjusting the distance from the target to the substrate to a preset distance; Evacuate the vacuum chamber to reach the background vacuum; inject oxygen and argon to sputter silicon dioxide on the substrate; in the argon environment, turn on the DC power supply to sputter metal titanium on the substrate; in the argon environment , turn on the DC power supply to sputter metal platinum on the substrate; after heating the substrate to 400 degrees Celsius, under the condition of oxygen and argon, turn on the radio frequency power supply to sputter barium strontium titanate on the substrate; after completing step 70, heat the substrate To 650 degrees Celsius, annealed in an oxygen environment. The invention not only simplifies the steps but also saves the cost; and the crystallization effect of the strontium barium titanate thin film is good.

Description

technical field [0001] The invention belongs to the technical field of thin film preparation, and in particular relates to a method for forming strontium barium titanate film on a lithium niobate substrate based on magnetron sputtering. Background technique [0002] As a type of PVD (Physical Vapor Deposition), magnetron sputtering is mainly used for the deposition of various functional thin films, and is widely used in pan-semiconductor fields such as integrated circuits, solar cells, LEDs, and flat panel displays. However, when sputtering barium strontium titanate thin films on lithium niobate substrates, it is difficult to crystallize barium strontium titanate films directly on lithium niobate substrates due to the problems of lattice mismatch and large difference in thermal expansion coefficients. There are few related reports. [0003] In view of the above reasons, the present invention proposes a method for forming strontium barium titanate film on a lithium niobate s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/10C23C14/18C23C14/02C23C14/58
CPCC23C14/024C23C14/025C23C14/06C23C14/10C23C14/185C23C14/35C23C14/5806
Inventor 张辉毛飞龙殷国栋倪中华
Owner SOUTHEAST UNIV