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A treatment method for prolonging the service life of polishing cloth

A processing method and polishing cloth technology, which are applied in grinding/polishing equipment, parts of grinding machine tools, abrasive surface adjustment devices, etc., can solve the problem of changing the surface flatness of polishing cloths, products that cannot meet customer requirements, and affecting silicon substrates. Polished sheet geometry and other issues, to achieve the effect of improving the service life

Active Publication Date: 2021-06-22
GRINM SEMICONDUCTOR MATERIALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The former cleaning method cannot effectively remove the blockages in the pores on the surface of the polishing cloth, and the service life of the polishing cloth is always maintained at about tens of hours
The latter method is effective, but it will change the flatness of the surface of the polishing cloth, and then affect the geometry of the silicon substrate polishing sheet, making the product unable to meet customer requirements

Method used

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  • A treatment method for prolonging the service life of polishing cloth

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Embodiment 1

[0022] The polishing cloth pasted on the large plate of the polishing machine is made of polyurethane and has a non-woven structure, and the model is Suba 800. The diameter of the large plate of the polishing machine is 1270mm, and the diameter of the brush plate is 483mm.

[0023] Every time the polishing machine produces a batch, use the brush plate to brush the cloth once in the following way. Place the brush disc with the same diameter as the pressure head on the surface of the polishing machine on which the polishing cloth is pasted. The diameter of the bristles of the brush disc is 1.2mm, and the bristles are 18mm above the brush disc. Press the brush disc with the pressure head of the polishing machine, and the pressure head will supply The pressure is 80kg, the rotation speed of the polishing machine is 45rpm, the rotation speed of the brush is 45rpm, and the rotation direction of the two is the same. The ultrapure water flow rate on the polishing cloth is 12L / min, an...

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Abstract

The invention discloses a treatment method for prolonging the service life of a polishing cloth, which comprises the following steps: (1) brush plate and brush cloth: place the brush plate on the surface of the polishing machine plate on which the polishing cloth is pasted, and press it with the pressure head of the polishing machine Brush plate, the brush plate rotates in the same direction as the large plate of the polishing machine; (2) High-pressure water washing: wash the surface of the polishing cloth with high-pressure water, and rinse the entire polishing cloth with high-pressure water; (3) Dressing ring grinding: place the dressing ring On the polishing cloth, use the pressure head of the polishing machine to press the dressing ring. The dressing ring and the polishing machine pan rotate in the same direction. The dressing ring grinds the polishing cloth for 10s to 5 minutes; then make the dressing ring rotate in the opposite direction to the polishing machine pan. Keep the pressure range, rotation speed range and ultrapure water flow range unchanged, and continue to grind the polishing cloth for 10 seconds to 5 minutes. The method of the invention has a very significant prolonging effect on the service life of the polishing cloth, can effectively prolong the service life of the polishing cloth, and never affects the geometrical level of the silicon substrate polishing sheet.

Description

technical field [0001] The invention relates to a treatment method for prolonging the service life of a polishing cloth, which belongs to the technical field of semiconductor materials. Background technique [0002] The polishing cloth used for chemical mechanical polishing (CMP) is generally made of polyurethane material, which is processed into a non-woven structure and densely covered with tiny holes. Cooperate with polishing liquid containing alkaline colloidal silica particles to complete the process of alternating mechanical grinding and chemical corrosion. This process can easily cause the colloidal silica particles to coagulate, block the tiny pores on the surface of the polishing cloth, and make the polishing cloth lose the effect of mechanical grinding. [0003] The traditional method of improving the service life of polishing cloths is to remove the blockages in the pores on the surface of the polishing cloth by mechanical or chemical means, or to use a dressing ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24B53/017
CPCB24B53/017
Inventor 林霖史训达李彦君刘云霞陈克强杨少昆周莹莹李奇
Owner GRINM SEMICONDUCTOR MATERIALS CO LTD
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