Composite thin film, quantum dot light-emitting diode and preparation method thereof
A technology of quantum dot light emission and composite thin film, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of complicated and difficult development, and achieve the effect of expanding the scope of application
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Embodiment 1
[0094] Embodiment 1: FTS surface treatment graphene quantum dots, improve work function
[0095] Prepare the graphene quantum dot solution: dissolve the graphene quantum dots in ethanol at a concentration of 10 mg / ml;
[0096] Preparation of graphene quantum dot film: deposit graphene quantum dot solution on the substrate, then bake at 70°C for 1 hour;
[0097] Put the above substrate into a vacuum environment for 1 hour, and then put it into a nitrogen environment for standby;
[0098] Prepare FTS solution: Dissolve FTS in n-hexane to a concentration of 0.5 mg / ml;
[0099] Immerse the substrate deposited with the graphene quantum dot film in the above-mentioned FTS solution for two minutes to fully react and combine the tridecafluoro group with the hydroxyl group of the graphene quantum dot;
[0100] Two minutes later, the substrate was taken out, and the surface of the graphene quantum dot film was cleaned with n-hexane solvent, and then baked at 120° C. for half an hour. ...
Embodiment 2
[0101] Embodiment 2: APTS surface treatment graphene quantum dots, reduce work function
[0102] Prepare the graphene quantum dot solution: dissolve the graphene quantum dots in ethanol at a concentration of 10 mg / ml;
[0103] Preparation of graphene quantum dot film: deposit graphene quantum dot solution on the substrate, then bake at 70°C for 1 hour;
[0104] Put the above substrate into a vacuum environment for 2 hours, and then put it into a nitrogen environment for standby;
[0105] Prepare APTS solution: Dissolve APTS in n-hexane to a concentration of 0.5 mg / ml;
[0106] Immerse the substrate deposited with the graphene quantum dot film in the above-mentioned APTS solution for two minutes to fully react and combine the amino groups with the epoxy groups of the graphene quantum dots;
[0107] Two minutes later, the substrate was taken out, and the surface of the graphene quantum dot film was cleaned with n-hexane solvent, and then baked at 120° C. for half an hour.
Embodiment 3
[0108] Embodiment 3: Apply the graphene quantum dots of FTS treatment and the graphene quantum dots of APTS treatment respectively as hole transport layer and electron transport layer, prepare quantum dot light-emitting diode
[0109] Use transparent conductive film ITO as the anode, 50nm thick;
[0110] In the air environment, deposit PEDOT:PSS on the anode as a hole injection layer by solution method, with a thickness of 30nm, and anneal in air at 150°C for 10 minutes;
[0111] In a nitrogen environment, use solution method to deposit graphene quantum dots on the hole injection layer as a hole transport layer, with a thickness of 30nm, anneal at 70°C for 1 hour in a nitrogen environment, then immerse the substrate in the FTS solution, and take it out after 2 minutes , wash the surface of the substrate with n-hexane, and anneal at 120°C for half an hour;
[0112] In a nitrogen environment, deposit CdSe / ZnS as a quantum dot light-emitting layer on the hole transport layer by ...
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