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Semiconductor laser six-degree-of-freedom error measurement system based on interferometer module

An interferometer module and error measurement technology, which is applied to measurement devices, instruments, optical devices, etc., can solve the problems that the measurement system becomes larger, is not conducive to online measurement of motion errors, and the instrument is expensive, and achieves easy adjustment of the optical path. The effect of overall volume reduction and low price

Active Publication Date: 2021-05-07
DALIAN UNIV OF TECH
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Problems solved by technology

Although the existing commercial laser interferometer can realize simultaneous measurement of multi-degree-of-freedom errors, as the number of measured errors increases, the volume of the measurement system will become larger
At the same time, the price of the instrument has become very high
It is not conducive to the realization of high-precision online measurement of motion errors of multi-axis positioning platforms

Method used

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  • Semiconductor laser six-degree-of-freedom error measurement system based on interferometer module
  • Semiconductor laser six-degree-of-freedom error measurement system based on interferometer module
  • Semiconductor laser six-degree-of-freedom error measurement system based on interferometer module

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Embodiment Construction

[0015] In order to illustrate the present invention more clearly, the invention will be analyzed in detail below in conjunction with the accompanying drawings and embodiments. It should be noted that the following specific descriptions are illustrative rather than restrictive, and should not limit the protection scope of the present invention.

[0016] as attached figure 1 As shown, the technical solution provided by the present invention is: a semiconductor laser six-degree-of-freedom motion error measurement system based on an interferometer module. The measurement system includes: a semiconductor laser 1, a first plane reflector 2, first to third polarization beam splitter prisms 3, 24, 22, first to third quarter wave plates 4, 5, 20, the first beam splitter Prism 6, second plane reflector 7, plano-convex lens 8, first four-quadrant detector 9, third dichroic prism 10, second corner cube prism 11, third plane reflector 12, third four-quadrant photodetector 13 , the first ...

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Abstract

The invention belongs to the field of motion error measurement of a positioning platform, and proposes a semiconductor laser six-degree-of-freedom error measurement system based on an interferometer module, including an interferometer module and a five-degree-of-freedom error measurement module. A semiconductor laser is used as its light source. The interferometer module based on the interferometer ranging principle is used to measure the positioning error and axial motion error of the linear positioning platform and the rotary positioning platform. The interferometer module adopts an integrated design, which reduces the occurrence of ghost images between optical components. At the same time, the volume of the interferometer module is reduced. The five-degree-of-freedom error measurement module based on the principle of laser collimation and laser autocollimation is used to measure the two-dimensional linearity error and three-dimensional angle error of the linear positioning platform or the two-dimensional inclination error, one-dimensional axial motion error and Two-dimensional radial motion error. Through different installation methods, the measurement system can realize online, full-parameter and high-precision measurement of the motion error of the linear positioning platform and the rotary positioning platform.

Description

technical field [0001] The invention belongs to the field of motion error measurement of a positioning platform, in particular to a semiconductor laser six-degree-of-freedom motion error measurement system based on an interferometer module. Background technique [0002] Positioning platforms include linear positioning platforms and rotary positioning platforms. Due to the existence of processing and assembly errors, both the linear positioning platform and the rotary positioning platform have motion errors of six degrees of freedom. The linear positioning platform has a positioning error along the motion axis, two linearity errors perpendicular to the motion axis, and three angular errors around the motion axis. The rotary positioning platform has a rotation angle positioning error along the rotation axis, two inclination angle errors perpendicular to the rotation axis, a motion error along the axial direction and two motion errors along the radial direction. How to measur...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/00G01B11/26G01B11/27G01B9/02
CPCG01B9/02015G01B11/00G01B11/26G01B11/27
Inventor 蔡引娣桑琦谢波文志祥凌四营范光照
Owner DALIAN UNIV OF TECH