Unlock instant, AI-driven research and patent intelligence for your innovation.

Color filter substrate and manufacturing method thereof

A technology of color filter substrate and manufacturing method, which is applied in the fields of optics, optomechanical equipment, nonlinear optics, etc., can solve problems such as spots on color filter substrates, achieve the goal of improving product yield, improving product quality, and avoiding abnormalities Effect

Active Publication Date: 2020-07-17
KUSN INFOVISION OPTOELECTRONICS
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a color filter substrate and a production method to solve the technical problem of spots in the production process of the existing color filter substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Color filter substrate and manufacturing method thereof
  • Color filter substrate and manufacturing method thereof
  • Color filter substrate and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0045] figure 1 is a partial cross-sectional view of a color filter substrate in an embodiment of the present invention, figure 2 It is a schematic plan view of the color filter substrate in the embodiment of the present invention. Please combine Figure 1 to Figure 2 , the present embodiment provides a color filter substrate, which includes a substrate 11 and periodically distributed prism structures 22 on the substrate 11, the prism structures 22 can play the role of converging light and concentrating light, so as to improve the utilization rate of light .

[0046] Figure 3a to Figure 3l A schematic diagram of the manufacturing process flow of the color filter substrate in the embodiment of the present invention. Please combine Figure 3a to Figure 3l , the present embodiment provides a method for manufacturing a color filter substrate, comprising the steps of:

[0047] Provide a base 11;

[0048] forming an insulating layer 20 on the substrate 11;

[0049] forming...

no. 2 example

[0076] Please combine Figure 4a to Figure 4i The difference between this embodiment and the first embodiment is that the opaque layer 30 formed on the base 11 is a black insulating layer.

[0077] This embodiment provides a method for manufacturing a color filter substrate, including steps:

[0078] Provide a base 11;

[0079] forming an insulating layer 20 on the substrate 11;

[0080] forming an opaque layer 30 on the substrate 11 formed with the insulating layer 20;

[0081] Process the opaque layer 30 to form a first opaque pattern layer 31, and process the first opaque pattern layer 31 to form a second opaque pattern layer 32;

[0082] Etching the insulating layer 20 by using the first opaque pattern layer 31 and the second opaque pattern layer 32 to form a periodic prism structure 22;

[0083] The second opaque pattern layer 32 is removed.

[0084] When the opaque layer 30 is a black insulating layer, the step of forming an opaque layer 30 on the substrate 11 forme...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a manufacturing method of a color filter substrate. The manufacturing method comprises the following steps: sequentially forming an insulating layer, a lightproof layer and a photoresist layer on a substrate; exposing and developing the photoresist layer; etching the lightproof layer for the first time; etching the insulating layer to form a periodic prism structure; carrying out film stripping processing on the photoresist layer; and etching the lightproof layer for the second time, and removing the lightproof layer. The invention provides the color filter substrate andthe manufacturing method thereof, the lightproof layer is added on an insulating layer, in the exposure process, light cannot irradiate an exposure machine table through the transparent insulating layer, the abnormity of the photoresist layer in the exposure and development process due to the light reflection of the exposure machine table is avoided, the mura phenomenon of the color filter substrate can be avoided, the product quality can be improved, and the product yield can be increased.

Description

technical field [0001] The invention relates to the field of display technology, and in particular to a color filter substrate and a manufacturing method. Background technique [0002] A liquid crystal display (Liquid Crystal Display, LCD) has many advantages such as thinness, energy saving, and no radiation, so it has gradually replaced the traditional cathode ray tube (CRT) display. Currently, liquid crystal displays are widely used in high-definition digital televisions, desktop computers, personal digital assistants (PDAs), notebook computers, mobile phones, digital cameras and other electronic devices. [0003] A liquid crystal display generally includes an array substrate and a color filter substrate oppositely arranged. Usually, when the color filter substrate is exposed and developed, the color filter substrate is placed on the exposure machine, the photomask with the target pattern is placed above the color filter substrate, and then light is irradiated from above ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335G03F7/00
CPCG02F1/133516G02F1/133514G03F7/0007
Inventor 柯健
Owner KUSN INFOVISION OPTOELECTRONICS