Double-layer high-entropy alloy composite film and preparation method and application thereof
A composite film and high-entropy alloy technology, applied in the field of high-entropy alloys, can solve the problem that inorganic materials cannot meet high toughness, high hardness and high resistivity at the same time, and achieve strong bonding force, uniform film structure and simple preparation method Effect
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Embodiment 1
[0028] A double-layer high-entropy alloy composite film, the bottom layer of the composite film is a copper layer, and the surface layer is (CoCrFeMnNi)X y , The layer has a coherent structure, X is a non-metallic element N, and the atomic ratio of Co, Cr, Fe, Mn, Ni, and X is 1:1:1:1:0.3.
[0029] A method for preparing a double-layer high-entropy alloy composite film, using the double-target automatic co-sputtering technology installed in a radio frequency magnetron sputtering apparatus, after pre-sputtering the purity 99.99% CoCrFeMnNi and Cu targets, through the automatic co-sputtering technology Copper thin film is first deposited on the silicon substrate, and then (CoCrFeMnNi)X is deposited continuously on the surface of the copper thin film. y film, forming a double-layer high-entropy alloy composite film with longitudinal composition and mechanical properties changes. Specifically include the following steps:
[0030] (1) Substrate preparation: place the polished sil...
Embodiment 2
[0041] A double-layer high-entropy alloy composite film, the bottom layer of the composite film is a copper layer, and the surface layer is (CoCrFeMnNi)X y , There is a coherent structure between the layers, X is a non-metallic element N, and the atomic ratio of Co, Cr, Fe, Mn, Ni, and X is 1:1:1:1:0.5.
[0042] A method for preparing a double-layer high-entropy alloy composite film is basically the same as in Example 1, except that the flow rate of high-purity nitrogen gas is 8 sccm during the sputtering process of the CoCrFeMnNi target in step (5).
[0043] The characterization method of the composite film is the same as in Example 1, and the results show that the surface layer hardness of the composite film is 11 GPa, the bottom layer hardness is 2 GPa, and the resistivity is 410 μΩ·cm.
Embodiment 3
[0045] A double-layer high-entropy alloy composite film, the bottom layer of the composite film is a copper layer, and the surface layer is (CoCrFeMnNi)X y , The layer has a coherent structure, X is a non-metallic element N, and the atomic ratio of Co, Cr, Fe, Mn, Ni, and X is 1:1:1:1:0.1.
[0046] A method for preparing a double-layer high-entropy alloy composite film is basically the same as in Example 1, except that the flow rate of high-purity nitrogen gas is 11 sccm during the sputtering process of the CoCrFeMnNi target in step (5).
[0047] The characterization method of the composite film is the same as in Example 1, and the results show that the surface layer hardness of the composite film is 15 GPa, the bottom layer hardness is 2 GPa, and the resistivity is 908 μΩ·cm.
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