Supercharge Your Innovation With Domain-Expert AI Agents!

Method for producing a planar polymeric stack

A technology of polymers and stacks, applied in the direction of originals for photomechanical processing, photosensitive materials for photomechanical devices, final product manufacturing, etc.

Pending Publication Date: 2020-09-01
ARKEMA FRANCE SA
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The method must also be easy to carry out and allow for industrial implementation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for producing a planar polymeric stack
  • Method for producing a planar polymeric stack
  • Method for producing a planar polymeric stack

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0143] According to a first embodiment, the constituent monomer(s) and / or dimer(s) and / or oligomer(s) of the prepolymer composition pre-TC (one or more ) and / or the polymer(s) are preferably contained in the presence of a reaction catalyst for generating an acid and / or a co-reactant capable of generating a reagent for an addition reaction on an epoxy functional group relative to Temperature reactive epoxy / oxirane functionality. The ratio prepolymer / (catalyst+additive) is preferably at most 1:1 by mass.

[0144] In this case, the monomeric and / or oligomeric and / or polymeric species of the composition can be selected, for example, from: copolymers based on acrylate chemical composition (property), which have a monomeric configuration, such as methyl Statistics for glycidyl acrylate-co-trifluoroethyl methacrylate-co-hydroxyethyl methacrylate or glycidyl methacrylate-co-trifluoroethyl methacrylate-co-butyl methacrylate or gradient copolymers.

[0145] According to this first em...

Embodiment 1

[0216] Example 1: Block Copolymers Used

[0217] The poly(1,1 dimethylsilylcyclobutane)-block used was synthesized by sequential anionic polymerization as already reported in the prior art (K. Aissou & al., Small, 2017, 13, 1603777) - Polystyrene ("PDMSB-b-PS") block copolymers. The block copolymer No. 1 used more specifically here has a number-average molar mass (Mn) of 17,000 g / mol and a polydispersity index of 1.09 as measured by steric exclusion chromatography (SEC) with polystyrene standards . The characterization revealed a composition of 51 mass % PS and 49 mass % PDMSB. The block copolymer No. 2 used more specifically here has a number-average molar mass (Mn) of 14,000 g / mol and a polydispersity index of 1.07. The characterization revealed a composition of 51 mass % PS and 49 mass % PDMSB. The measured period of block copolymer No. 1 is at ~ 18 nm, the measured period of No. 2 on the self-assembled film via Fast Fourier Transform (FFT) of images taken by scanning...

Embodiment 2

[0218] Example 2: Synthesis of Surface Passivation Layer and Topcoat Layer

[0219] Copolymers or homopolymers used in the context of the present invention have been polymerized by standard methods known to those skilled in the art, such as NMP (nitrogen oxide mediated polymerization, for example with an initiator, for example under the name Bloc Initiators sold by Arkema) or conventional free radical methods (with initiators such as azobisisobutyronitrile). The number average molar masses obtained are typically of the order of about Mn ~ 5,000-10,000 g / mol. The polymer used as neutralizing underlayer (underlayer) is poly-2-ethylhexyl methacrylate homopolymer. The copolymer used as the topcoat layer has a poly(glycidyl methacrylate-co-trifluoroethyl methacrylate-co-hydroxyethyl methacrylate) type copolymer construction, subsequently abbreviated as "PGFH" , with a variable "GFH" composition ranging from 25 / 3 / 72 to 25 / 47 / 28 by mass composition. In the absence of other indi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
glass transition temperatureaaaaaaaaaa
glass transition temperatureaaaaaaaaaa
polydispersity indexaaaaaaaaaa
Login to View More

Abstract

The invention concerns a method for producing a planar polymeric stack, said stack comprising at least first and second (co-)polymer layers (20, 30) stacked one on top of the other, the first underlying (co-)polymer layer (20) not having undergone any prior treatment allowing it to crosslink, at least one of the (co-)polymer layers initially being in a liquid or viscous state, said method being characterised in that the top layer (30), referred to as the top coat (TC), is deposited on the first layer (20) in the form of a pre-polymer composition (pre-TC), comprising at least one monomer and / ordimer and / or oligomer and / or polymer in solution, and in that it is then subjected to a heat treatment capable of causing a crosslinking reaction in the molecular chains within said layer (30, TC).

Description

technical field [0001] The present invention relates to the field of polymer stacks. [0002] More particularly, the present invention relates to a method of controlling the flatness of such a stack. The present invention also relates to a method of manufacturing nanolithography (nanolithography) masks using such a stack, the flatness of which is controlled, and to polymers obtained by said method of flatness control. Stacks. [0003] Polymer stacks are used in a variety of industrial applications, among which may be mentioned in a non-exhaustive manner the production of coatings, inks, paints, films, biophases for the field of aerospace or aviation or motor vehicles or wind turbines Capacitive implants, packaging materials, or optical components, such as optical filters, or microelectronic, or optoelectronic or microfluidic components. The invention is applicable to all applications, whatever they may be, as long as the stack comprises at least two polymeric materials stac...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/00G03F7/20G03F7/027G03F7/038G03F7/09G03F7/095G03F7/11
CPCG03F7/0002G03F7/0045G03F7/027G03F7/038G03F7/091G03F7/095G03F7/0955G03F7/11G03F7/2059G03F7/028G03F7/033G03F7/0757G03F7/422C08F287/00G03F1/48G03F1/80
Inventor X.希瓦利埃
Owner ARKEMA FRANCE SA
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com