Conductive ink comprising diacetylene diol monomer and conductive polymer, and method for producing micropattern by using same
A technology of conductive polymers and conductive inks, applied in the direction of inks, conductive materials, conductive materials, etc., can solve the problems of increased surface resistance, difficult to transparent electrodes, etc., and achieve the effect of improving conductivity
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preparation Embodiment 1-9
[0098] 2,4-Hexadiyn-1,6-diol (HDO) was added to 1 g of PEDOT:PSS aqueous solution (Sigma-Aldrich) including 0.5% by weight of PEDOT and 0.8% by weight of PSS as shown in Table 1, and ultrasonically It was fully dissolved for 10 minutes to obtain a mixed solution. The mixed solution was filtered using a 0.45 mm filter to remove impurities to obtain conductive ink compositions for optical micromachining according to Preparation Examples 1-9.
[0099] Table 1
[0100]
[0101]
preparation Embodiment 10-12
[0103] In addition to using 6.5mg 3,5-octadiyne-1,8-diol (composition preparation example 10), 6.5mg 4,6-decadiyn-1,10-diol (composition preparation example 11 ) or 6.5 mg of 5,7-dodecadiyne-1,12-diol (composition preparation example 12) instead of 6.5 mg of 2,4-hexadiyne-1,6-diol (HDO) , A composition was prepared in the same manner as in Preparation Example 6.
[0104] Examples of Micropattern Preparation
preparation Embodiment 1
[0106] One of the prepared conductive ink compositions was spin-coated on a glass substrate to obtain a uniform conductive film, and then dried to measure the conductivity of the conductive film. A photomask with a light-transmitting pattern is arranged on the conductive film, and the photomask is used as a mask to irradiate a wavelength of 254nm (12.5mWcm -2 ) of ultraviolet light for 10 seconds. After the UV exposure, the substrate with the conductive film was immersed in water to remove the portion not irradiated by UV, and then washed with ethanol to form a conductive pattern. Then, the conductive pattern was dried, and the conductivity of the dried conductive pattern was measured.
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