Magnetic pipe bending mechanism for target material

Abstract

The invention relates to the technical field of vacuum coating equipment, in particular to a magnetic pipe bending mechanism for a target material. The magnetic pipe bending mechanism for the target material comprises a base, a vacuum pipe bending part, an electromagnetic coil, a target material liquid cooling fixing assembly and an arc striking assembly, the base is installed at one end of the vacuum pipe bending part, the electromagnetic coil is wound around the outer wall of the vacuum pipe bending part, the target material liquid cooling fixing assembly is used for installing the target material and cooling the target material, and the arc striking assembly is used for driving the target material to generate arc spots. According to the magnetic pipe bending mechanism for the target material, the moving track of a charged sputtering atom is overlapped with or parallel to the central axis of the vacuum bent pipe part under the action of the electromagnetic field force, and the central axis of the vacuum bent pipe part is in a bent arc shape, so that the charged sputtering atom is sputtered to the surface of a workpiece at a preset position along a specific path, and a coating isformed through deposition; and the flowing cooling liquid is introduced to the inner part of the target material liquid cooling fixing assembly, so that the target material liquid cooling fixing assembly can be rapidly cooled, the target material liquid cooling fixing assembly and the target material are protected, and the service life of the target material liquid cooling fixing assembly is prolonged.

Description

technical field [0001] The invention relates to the technical field of vacuum coating equipment, in particular to a magnetic bending mechanism for a target. Background technique [0002] Vacuum coating technology, as a technology to produce a specific film layer, has a wide range of applications in real production and life. There are three forms of vacuum coating technology, namely evaporation coating, sputtering coating and ion plating. Among them, magnetron sputtering can be considered as one of the most outstanding achievements in coating technology. With the advantages of high sputtering rate, low substrate temperature rise, good film-substrate bonding force, stable device performance, and convenient operation and control, it has become the application field of coating industry, especially architectural coated glass, transparent conductive film glass, and flexible substrate rolls. It is the first choice for continuous coating occasions such as winding plating, which ha...

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Problems solved by technology

[0003] In the prior art, it is difficult to control the sputtering path of the charged sputtering atoms during the sputtering process, and usually only sputtering along a straight path can be achieved, the accuracy of sputtering is low, and the coating effect of the workpiece is poor; in addition, positive ions bombard the target During the sputtering process, the internal parts in contact with the target are in an ultra-high temperature state, which is easy to be burned, resulting in the failure of the entire sputtering process and the failure of the coating of the workpiece, which cannot meet the needs of modern production

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