Immersion liquid supply and recovery device with novel pumping and discharging assembly and immersion liquid pumping and discharging method

Abstract

The invention discloses an immersion liquid supply and recovery device with a novel pumping and discharging assembly and an immersion liquid pumping and discharging method. The device comprises a substrate, an immersion liquid supply channel, an immersion liquid recovery channel, a liquid-phase pumping and discharging channel, a gas-phase pumping and discharging channel, a pumping and dischargingcavity, a pumping and discharging opening and a selective pumping and discharging pipe. A plurality of pumping and discharging openings are formed in one side, opposite to the substrate, of the immersion liquid supply and recovery device. A pumping and discharging cavity is formed in the immersion liquid supply and recovery device, a plurality of selective pumping and discharging pipes are arranged in the pumping and discharging cavity, the pumping and discharging openings are communicated with the pumping and discharging cavity, one end of each selective pumping and discharging pipe is communicated with one pumping and discharging opening, the other end of each selective pumping and discharging pipe is communicated with the liquid-phase pumping and discharging channel, and the gas-phase pumping and discharging channel is connected with the pumping and discharging cavity. The negative pressure pulsation inhibition on the gas-liquid two-phase flow is improved, the vibration characteristic of the immersion liquid supply recovery device is improved, the pumping and discharging capability of a recovery port on immersion liquid is improved, and the exposure quality is improved.

Description

technical field [0001] The invention relates to an immersion photolithography machine, in particular to an immersion liquid supply and recovery device and an immersion liquid extraction method used in the immersion photolithography machine. Background technique [0002] For the filling of immersion liquid in the existing immersion lithography machine, the currently widely used solution is the partial immersion method, that is, using the immersion liquid supply and recovery device to confine the liquid between the lower surface of the last projection objective lens and the upper surface of the substrate In the local area; maintaining the optical consistency and transparency of the immersion liquid in the exposure area is the key to ensuring the quality of immersion lithography exposure. For this reason, the existing technical solutions often realize the real-time update of the immersion flow field through liquid injection and recovery, and take the photochemical pollutants, l...

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Problems solved by technology

[0006] The present invention solves the problem of existing immersion photolithography machines that it is difficult to effectively form a two-phase flow in the immersion liquid supply and recovery device to completely suppress the negative pressure pulsation, which is not conducive to ensuring the extraction capacity of the recovery port for the immersion liquid, and easily affects the reduction of exposure. It can effectively separate and pump the gas-liquid two-phase flow from the submerged flow field, improve the suppression of negative pressure pulsation generated by the gas-liquid two-phase flow, and is more conducive to improving the vibration of the immersion liquid supply and recovery device. characteristics, improve the pumping ability of the recovery port for the immersion liquid, and improve the exposure quality. The immersion liquid supply and recovery device with a new type of pumping component and the immersion liquid pumping method

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