Light radiation-resistant high-reflectivity film and preparation method thereof
A technology with high reflectivity and radiation resistance, applied in sputtering coating, metal material coating process, vacuum evaporation coating, etc. Easy to oxidize and other problems, to achieve the effect of reducing radiation heat transfer, avoiding the reduction of reflectivity, and avoiding thermal deformation
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Embodiment 1
[0037] A method for preparing a light-weight, radiation-resistant, high-reflectivity film, characterized in that:
[0038] a. First open the vacuum chamber, install the membrane material, measure the diameter of the membrane material at the winding and unwinding place, and adjust the tension; then close the vacuum chamber, turn on the power, and check whether the coating drum can work normally; turn on the cooling water switch of the pump group, and turn on Fore-stage pump unit, start vacuuming after 5 minutes, the vacuum degree is less than 5×10 -3 At Pa, prepare for coating; check the temperature of the coating drum and the cryogenic temperature, turn on the cathode cooling water and the pretreatment heater, adjust the tension, and start the coil.
[0039] b. Rotate the metal copper target, adjust the distance between the substrate and the target, the distance between the metal copper target and the substrate is 10cm; feed argon gas, the flow rate of argon gas is 30sccm, cle...
Embodiment 2
[0046] A method for preparing a light-weight, radiation-resistant, high-reflectivity film, characterized in that:
[0047] a. First open the vacuum chamber, install the membrane material, measure the diameter of the membrane material at the winding and unwinding place, and adjust the tension; then close the vacuum chamber, turn on the power, and check whether the coating drum can work normally; turn on the cooling water switch of the pump group, and turn on Fore-stage pump unit, start vacuuming after 5 minutes, the vacuum degree is less than 5×10 -3 At Pa, prepare for coating; check the temperature of the coating drum and the cryogenic temperature, turn on the cathode cooling water and the pretreatment heater, adjust the tension, and start the coil.
[0048] b. Rotate the metal copper target, adjust the distance between the substrate and the target, the distance between the metal copper target and the substrate is 6cm; feed argon, the flow rate of argon is 200sccm, clean the g...
Embodiment 3
[0055] A method for preparing a light-weight, radiation-resistant, high-reflectivity film, characterized in that:
[0056] a. First open the vacuum chamber, install the membrane material, measure the diameter of the membrane material at the winding and unwinding place, and adjust the tension; then close the vacuum chamber, turn on the power, and check whether the coating drum can work normally; turn on the cooling water switch of the pump group, and turn on Fore-stage pump unit, start vacuuming after 5 minutes, the vacuum degree is less than 5×10 -3 At Pa, prepare for coating; check the temperature of the coating drum and the cryogenic temperature, turn on the cathode cooling water and the pretreatment heater, adjust the tension, and start the coil.
[0057] b. Rotate the metal copper target, adjust the distance between the substrate and the target, the distance between the metal copper target and the substrate is 4cm; feed argon gas, the flow rate of argon gas is 500sccm, cle...
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Abstract
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