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A kind of ultraviolet dose detector based on nucleic acid material and its preparation method

A detector and nucleic acid technology, applied in the field of ultraviolet detection, can solve the problems of low photoresponsivity, low measurement accuracy, low sensitivity, etc., and achieve the effects of sensitive response, simple process and easy miniaturization

Active Publication Date: 2021-09-24
FUDAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to solve the problems of relatively low photoresponsivity, low sensitivity and low measurement accuracy in the detection of ultraviolet radiation intensity and dose, and to provide a nucleic acid material-based ultraviolet dose detector and its preparation method. Nucleic acid materials and semiconductors are compounded, making full use of the characteristics of nucleic acid materials that will produce irreversible structural changes under the irradiation of medium and short-wave ultraviolet light and the advantages of semiconductor materials that can control the electron transport characteristics, to achieve the detection of ultraviolet radiation dose, sensitive response, easy miniaturization Flexible and wearable devices can be prepared

Method used

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  • A kind of ultraviolet dose detector based on nucleic acid material and its preparation method
  • A kind of ultraviolet dose detector based on nucleic acid material and its preparation method
  • A kind of ultraviolet dose detector based on nucleic acid material and its preparation method

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Embodiment 1

[0032] First, single-layer graphene was grown on a 25-micron-thick copper foil by chemical vapor deposition, and the graphene was transferred to a patterned Cr / Au (thickness of 5 / 300 mm) prepared by thermal evaporation technology in advance by electrochemical exfoliation. 40 nm) material electrode SiO 2 / Si substrate to obtain graphene transistor devices.

[0033] Then, modify a layer of benzoic acid N-hydroxysuccinimide ester on the graphene surface as a probe connector, the solvent used is dimethyl sulfoxide, the modified concentration is 5 mmol / L, and the modified reaction temperature is 25 Celsius, the reaction time is 1.5 hours, washed with ethanol and distilled water three times respectively, and dried under high-purity nitrogen.

[0034] Next, modify the rectangular DNA origami structure (DNA Origami) on the surface of the device. The buffer solution used is tris hydroxymethylaminomethane acetate and ethylenediaminetetraacetic acid buffer solution. The modified concent...

Embodiment 2

[0037] First, single-layer graphene was grown on a 25-micron-thick copper foil by chemical vapor deposition, and the graphene was transferred to a patterned Cr / Au (thickness of 5 / 300 mm) prepared by thermal evaporation technology in advance by electrochemical exfoliation. 40 nm) material electrode SiO 2 / Si substrate to obtain graphene transistor devices.

[0038] Then, modify a layer of benzoic acid N-hydroxysuccinimide ester on the graphene surface as a probe connector, the solvent used is dimethyl sulfoxide, the modified concentration is 5 mmol / L, and the modified reaction temperature is 25 Celsius, the reaction time is 1.5 hours, washed with ethanol and distilled water three times respectively, and dried under high-purity nitrogen.

[0039] Next, modify the rectangular DNA origami structure (DNA Origami) on the surface of the device. The buffer solution used is Tris hydroxymethylaminomethane acetate and EDTA buffer solution. The modified concentration is 2 nmol / liter. The...

Embodiment 3

[0042] First, single-layer graphene was grown on a 25-micron-thick copper foil by chemical vapor deposition, and the graphene was transferred to a patterned Cr / Au (thickness of 5 / 300 mm) prepared by thermal evaporation technology in advance by electrochemical exfoliation. 40 nm) material electrode SiO 2 / Si substrate to obtain graphene transistor devices.

[0043] Then, modify a layer of benzoic acid N-hydroxysuccinimide ester on the graphene surface as a probe connector, the solvent used is dimethyl sulfoxide, the modified concentration is 5 mmol / L, and the modified reaction temperature is 25 Celsius, the reaction time is 1.5 hours, washed with ethanol and distilled water three times respectively, and dried under high-purity nitrogen.

[0044] Next, modify the rectangular DNA origami structure (DNA Origami) on the surface of the device. The buffer solution used is Tris hydroxymethylaminomethane acetate and EDTA buffer solution. The modified concentration is 10 nmol / liter. The ...

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Abstract

The invention belongs to the technical field of ultraviolet detection, and specifically discloses a nucleic acid material-based ultraviolet dose detector and a preparation method thereof. First, a transistor device with a semiconductor channel exposed to the outside is prepared; then, nucleic acid materials of different configurations are passed through the probe The linker is modified on the surface of the semiconductor channel to obtain a transistor device with nucleic acid materials evenly distributed on the surface. In the present invention, nucleic acid material is used as optical signal recognition material, semiconductor is used as signal transduction medium, and the characteristics of irreversible structural changes of nucleic acid material under the irradiation of a certain dose of medium-wave and short-wave ultraviolet light are utilized, which affects its doping of the underlying semiconductor material. Hybrid regulation, so as to realize the direct detection of UV dose. The invention has a simple process, can realize medium and short-wave ultraviolet dose sensing in the range of 200-315 nanometers, has a sensitive response, is easy to miniaturize, can be used in flexible wearable devices, and has the potential to be widely used in the fields of biology, medical treatment and health.

Description

technical field [0001] The invention belongs to the technical field of ultraviolet detection, and in particular relates to an ultraviolet dose detector based on a nucleic acid material and a preparation method thereof. Background technique [0002] Nucleic acid is an essential component of all known life forms. With the development of artificial nucleic acid synthesis technology, the research on this material has attracted extensive attention. Nucleic acid materials can be controllably synthesized with complex geometric nanostructures after specific structural design. The nanostructure of nucleic acid materials will undergo conformational changes under the influence of external signals, resulting in changes in functional properties. This feature has broad application prospects in the fields of nanosensors and nanoactuators. Among the various external signals studied so far, different doses of short- and medium-wavelength ultraviolet radiation can directly affect the conform...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01J1/42
CPCG01J1/429G01J2001/4295
Inventor 魏大程王丽倩艾昭琳郭倩颖
Owner FUDAN UNIV