Design method for correcting second-order aberration based on Wien analyzer
A design method and analyzer technology, applied in the direction of semiconductor/solid-state device testing/measurement, discharge tube, electrical components, etc., can solve problems such as second-order aberration of deflection system without in-depth consideration, no correction, etc., to achieve superiority The effects of electron optics focusing on imaging performance, reducing second-order aberrations, and increasing space utilization
Active Publication Date: 2020-12-11
XI AN JIAOTONG UNIV
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[0005] In the current electron beam imaging system and detection equipment, it is often used to add an additional function of eliminating astigmatism to the Wien analyzer, only to achieve good focusing properties of the entire system, and does not consider the deflection system in depth. Brings second-order aberrations and doesn't correct for it
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[0022] The present invention will be further described in detail below.
[0023] A design method for correcting second-order aberrations based on the Wien analyzer. When the electron beam imaging or detection system has a deflection system, the field function is expanded and analyzed along the optical axis in series. The electron optical characteristics of the system can analyze the second-order aberration caused by the deflection system; using the Wien analyzer, a quadrupole field is introduced to compensate the second-order aberration caused by the deflection system in the electron beam imaging or detection system, specifically, By applying a voltage signal excitation to the arc electrode, the Wien analyzer can generate the required quadrupole field, superimposed on the Wien analyzer, and control and adjust the azimuth and excitation intensity of the quadrupole field, so as to achieve compensation for electron beam imaging Or the second-order aberration of the detection syst...
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The invention discloses a design method for correcting second-order aberration based on a Wien analyzer. The method comprises the steps: when a deflection system exists, enabling a field function to be subjected to series expansion along the vicinity of an optical axis to analyze the electron-optical characteristics of a system, and analyzing the second-order aberration caused by deflection; employing the Wien analyzer, and applying voltage signal excitation to an arc electrode, so that the analyzer generates a required quadrupole field, and the quadrupole field is superposed on the Wien analyzer; calculating the optical characteristics of the whole imaging system or detection system, and controlling and adjusting the azimuth angle and the excitation intensity of the added quadrupole fieldaccording to the calculation result of the superimposed quadrupole field, so the second-order aberration of the system caused by deflection is compensated.
Description
technical field [0001] The invention relates to the technical field of semiconductor detection and the field of electron beam imaging, in particular to a design method for correcting second-order aberrations based on a Wien analyzer. Background technique [0002] With the development of semiconductor technology and the advancement of process technology, the size of devices continues to shrink, and those defects and particles that were not important at previous nodes may have a fatal impact on device performance. At the same time, due to the introduction of new materials, the development of new processes and the use of a new generation of photolithography technology, many new defects have been brought about. In order to meet the needs of physical research and the production of semiconductor devices and integrated circuits, electron beam imaging systems and detection equipment are required to have higher resolution and larger scanning fields. [0003] What was pursued before ...
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IPC IPC(8): H01J37/147H01J37/153H01J37/28H01L21/66
CPCH01J37/1474H01J37/153H01J37/28H01L22/12
Inventor 康永锋常飞浩胡航锋赵静宜
Owner XI AN JIAOTONG UNIV