Second-order aberration compensation method of high-resolution large-scanning-field system
A compensation method and scanning field technology, applied in the analysis of materials, material analysis using wave/particle radiation, measurement devices, etc., can solve deflection aberration without consideration and analysis, second-order aberration without effective consideration and analysis, and no correction Implementation methods and other issues to achieve the effect of improving device utilization
Active Publication Date: 2020-12-18
XI AN JIAOTONG UNIV
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[0004] In the current electron beam imaging system and detection equipment, a stigmatizer device is often added separately to the system, which is only used to eliminate the astigmatism problem on the axis of the system, without considering the deflection aberration caused by deflection. Moreover, due to the flaws in the analysis of the existing methods, there is no effective consideration and analysis of the second-order aberration, and there is no implementation method for correcting it.
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[0022] The present invention will be further described in detail below.
[0023] A second-order aberration compensation method for a high-resolution large-scanning field system. In electron beam detection and imaging equipment, when the electron beam detection or imaging system has a deflection system, the field function is graded along the optical axis. The electronic optical characteristics of the digital expansion analysis system can analyze the second-order aberration caused by the deflection system; the electrostatic eight-pole deflector is used to excite the arc electrode by applying a voltage signal, so that the deflector generates the required quadrupole field, superimposed On the electrostatic deflector, control and adjust the azimuth and excitation intensity of the quadrupole field, so as to compensate the second-order aberration caused by the deflection system of the electron beam detection or imaging system, and the eight-pole electrostatic deflector can also be rep...
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The invention discloses a second-order aberration compensation method of a high-resolution large-scanning-field system, and aims to analyze the second-order aberration caused by deflection by performing series expansion on a field function along the vicinity of an optical axis to analyze the electron-optical characteristics of the system in the presence of a deflection system. An electrostatic octopole deflector is utilized, voltage signal excitation is applied to an arc electrode, and the deflector generates a required quadrupole field to be superposed on the electrostatic deflector. The optical characteristics of the whole imaging system or detection system are calculated, and the azimuth angle and the excitation intensity of the added quadrupole field are controlled and adjusted according to the calculation result after the quadrupole field is superposed so that the second-order aberration of the system caused by deflection is compensated.
Description
technical field [0001] The invention relates to the fields of electron beam imaging and electron beam defect detection, in particular to a second-order aberration compensation method for a high-resolution large scanning field system. Background technique [0002] With the development of semiconductor technology and the advancement of process technology, the size of devices continues to shrink, and those defects and particles that were not important at previous nodes may have a fatal impact on device performance. At the same time, due to the introduction of new materials, the development of new processes and the use of a new generation of photolithography technology, many new defects have been brought about. In order to meet the needs of physical research and the production of semiconductor devices and integrated circuits, electron beam imaging systems and detection equipment are required to have higher resolution and larger scanning fields. [0003] What was pursued before ...
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IPC IPC(8): G01N23/00H01L21/66
CPCG01N23/00H01L22/12
Inventor 康永锋常飞浩胡航锋赵静宜
Owner XI AN JIAOTONG UNIV