Silicon-based negative electrode material, preparation method thereof, and related products
A silicon-based negative electrode material and silicon-based material technology, applied in the field of electronics, can solve the problems of negative electrode deterioration, silicon volume expansion, etc., and achieve the effects of improving discharge specific capacity, high capacity retention rate, and improving cycle stability
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Embodiment 1
[0059] Embodiment 1: the preparation method steps of the silicon-based negative electrode material 11 at least include the following steps. Understandably, this
[0060] 110: With reference to FIG. 4, a silicon-based material 112 is prepared.
[0062] In this embodiment, the silicon-based material 112 is in the form of particles. The particle size of the silicon-based material 112 is 1 nm˜50 μm.
[0063] When preparing the silicon-based material 112, a powder or solution of the silicon-based material 112 can be prepared, including several silicon-based materials 112.
[0064] 120: Prepare a coating substrate such that the coating substrate includes a number of coating particles 114.
[0065] The coating layer 113 includes several coating particles 114. The coated particles 114 are nanoparticles. Coated particles
[0067] A plurality of coating particles 114 are provided on the surface of the silicon-based material 112 by atomic layer deposition, so that a plurality of coating ...
Embodiment 2
[0069] Embodiment 2: Please refer to FIG. 11 , the steps of the preparation method of the silicon-based negative electrode material 11 at least include the following steps. Can
[0070] 210: With reference to FIG. 4, a silicon-based material 112 is prepared.
[0072] In this embodiment, the silicon-based material 112 is in the form of particles. The particle size of the silicon-based material 112 is 1 nm˜50 μm.
[0073] When preparing the silicon-based material 112, a powder or solution of the silicon-based material 112 can be prepared, including several silicon-based materials 112.
[0074] 220: Prepare a coated substrate such that the coated substrate includes a number of coated particles 114.
[0075] The coating layer 113 includes several coating particles 114. The coated particles 114 are nanoparticles. Coated particles
[0079] depositing a plurality of the coating particles 114 on the outer surface of the silicon-based material 112 by an atomic layer deposition process, ...
Embodiment 3
[0088] Embodiment 3: Please refer to FIG. 18 , the steps of the preparation method of the silicon-based negative electrode material 11 at least include the following steps. Can
[0089] 310: Referring to FIG. 4 in conjunction, a silicon-based material 112 is prepared.
[0091] In this embodiment, the silicon-based material 112 is in the form of particles. The particle size of the silicon-based material 112 is 1 nm˜50 μm.
[0092] When preparing the silicon-based material 112, a powder or solution of the silicon-based material 112 can be prepared, including several silicon-based materials 112.
[0093] 320: Dispersing the silicon-based material 112.
[0097] Optionally, the silicon-based material 112 is dispersed in a solvent, and is processed by ball milling for 0.5 to 10 hours to obtain a uniform dispersion.
[0099] Further, a dispersant may be added to the silicon-based material 112, followed by ball milling. Dispersants include but are not limited to
[0100] After the silic...
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Abstract
Description
Claims
Application Information
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