LED chip with p-type insertion layer and manufacturing method thereof
An LED chip and manufacturing method technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of low light extraction efficiency, low hole injection efficiency, serious overflow, etc., so as to improve luminous performance, reduce electron leakage, extend the The effect of the service life
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[0040] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0041] At present, in order to improve the luminous efficiency of LEDs, some technologies set an insertion layer between the multi-quantum well structure and the P-type electron blocking layer. The insertion layer is more of a structure similar to a hole injection layer, including high Mg doping AlInGaN insertion layer, GaN insertion layer, and AlN insertion layer, etc.
[0042] However, the high Mg-doped AlInGaN insertion layer and the GaN insertion layer mainl...
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