Ternary positive electrode material with double-layer coating structure on surface, and preparation method thereof
A positive electrode material, double-layer coating technology, applied in the field of ternary positive electrode material and its preparation, can solve the problems of no effect on the improvement of battery rate performance, structural damage of positive electrode active material, collapse of surface structure, etc. Secondary sintering process, excellent electrical conductivity, the effect of mitigating structural changes
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Embodiment 1
[0025] A method for preparing a ternary positive electrode material with a double-layer coating structure on the surface, comprising the steps of:
[0026] S1. Preparation of surface-coated MoS 2 Ternary material precursors for nanosheet coating:
[0027] 1mol sodium molybdate (Na 2 MoO 4 . h 2 O), 6mol thioacetamide (C 2 h 5 NS) and 1mol hydrated silicotungstic acid and 4kg of ternary precursor Ni 0.85 co 0.1 mn 0.05 (OH) 2 (x+y+z=1) was dissolved in deionized water, and continuously stirred for 2h, wherein the mass ratio of ternary precursor to deionized water was 1:3; Heating at high temperature for 24h. After vacuum filtration and washing, the precipitate was vacuum-dried in an oven at 100°C for 6 hours to obtain the surface-coated MoS 2 Ternary material precursor for nanosheet coating;
[0028] S2, prepare Al(OH) 3 Cladding:
[0029] Coating the surface in step S1 with MoS 2 The ternary material precursor of the nanosheet coating layer was added to deioniz...
Embodiment 2
[0033] A method for preparing a ternary positive electrode material with a double-layer coating structure on the surface, comprising the steps of:
[0034] S1. Preparation of surface-coated MoS 2 Ternary material precursors for nanosheet coating:
[0035] 1mol sodium molybdate (Na 2 MoO 4 . h 2 O), 6mol thioacetamide (C 2 h 5 NS) and 1mol hydrated silicotungstic acid (H 4 [SiO 4 (W 3 o 9 ) 4 ]·xH 2 O) and 5kg of ternary precursor Ni 0.85 co 0.1 mn 0.05 (OH) 2 (x+y+z=1) was dissolved in deionized water, and continuously stirred for 2h, wherein the mass ratio of ternary precursor to deionized water was 1:3; Heating at high temperature for 24h. After vacuum filtration and washing, the precipitate was vacuum-dried in an oven at 100°C for 6 hours to obtain the surface-coated MoS 2 Ternary material precursor for nanosheet coating;
[0036] S2, prepare Al(OH) 3 Cladding:
[0037] Coating the surface in step S1 with MoS 2 The ternary material precursor of the nan...
Embodiment 3
[0041] A method for preparing a ternary positive electrode material with a double-layer coating structure on the surface, comprising the steps of:
[0042] S1. Preparation of surface-coated MoS 2 Ternary material precursors for nanosheet coating:
[0043] 1mol sodium molybdate (Na 2 MoO 4 . h 2 O), 6mol thioacetamide (C 2 h 5 NS) and 1mol hydrated silicotungstic acid (H 4 [SiO 4 (W 3 o 9 ) 4 ]·xH 2 O) and 6kg of ternary precursor Ni 0.85 co 0.1 mn 0.05 (OH) 2 (x+y+z=1) was dissolved in deionized water, and continuously stirred for 2h, wherein the mass ratio of ternary precursor to deionized water was 1:3; Heating at high temperature for 24h. After vacuum filtration and washing, the precipitate was vacuum-dried in an oven at 100°C for 6 hours to obtain the surface-coated MoS 2 Ternary material precursor for nanosheet coating;
[0044] S2, prepare Al(OH) 3 Cladding:
[0045] Coating the surface in step S1 with MoS 2 The ternary material precursor of the nan...
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