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Optical device, projection optical system, exposure device, and production method for article

An optical device and optical element technology, which is applied in the field of article manufacturing and can solve problems such as light shading and the like

Pending Publication Date: 2021-02-02
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In the gas supply mechanism disclosed in Japanese Patent Laid-Open No. 2018-91919, the gas supply mechanism is arranged in the vertical direction of the two optical elements, so depending on the optical path of the light reaching each optical element, the light may be blocked by the gas supply mechanism. sex

Method used

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  • Optical device, projection optical system, exposure device, and production method for article
  • Optical device, projection optical system, exposure device, and production method for article
  • Optical device, projection optical system, exposure device, and production method for article

Examples

Experimental program
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Effect test

Embodiment 1

[0025] use figure 2 The optical device 100 of Example 1 will be described. The optical device 100 has a meniscus lens 101 as a first optical element, a convex mirror 102 as a second optical element, a lens barrel 103 as a holding portion for holding the meniscus lens 101, and a lens barrel 103 as a holding portion for holding the convex mirror 102. lens barrel 104 . exist figure 2 In the above, the lens barrel 103 and the lens barrel 104 are configured as independent structures, but the lens barrel 103 and the lens barrel 104 may be integrated to form a single lens barrel.

[0026] In addition, the first optical element is not limited to the meniscus lens 101, and may be a lens of another shape, or may be a mirror. Likewise, the second optical element is not limited to the convex mirror 102, and may be a mirror of another shape, or may be a lens or the like. In addition, the number of optical elements is not limited to two, and the optical device 100 may include three or...

Embodiment 2

[0044] Next, use Figure 4 The structure of the optical device 400 of the second embodiment will be described. In the optical device 400 of the second embodiment, compared with the optical device 100 of the first embodiment, the number of openings provided in the lens barrel 103 is increased. Specifically, the opening 115 is also provided in the vertical direction (Z-axis direction) of the lens barrel 103 . As a result, the amount of gas sucked from the outer space of the lens barrels 103, 104 to the inner space increases, so that the cooling force of the lens barrels 103, 104, the meniscus lens 101, and the convex mirror 102 can be further enhanced.

Embodiment 3

[0046] Next, use Figure 5 The structure of the optical device 500 of the third embodiment will be described. In the optical device 500 of the third embodiment, the arrangement of the gas discharge unit 107 of the optical device 100 of the first embodiment is different. Specifically, the gas discharge unit 501 is arranged on the upper portion of the convex mirror 102 .

[0047] The gas discharge unit 501 is arranged at a position in the negative direction of the Y-axis with respect to the lens barrel 104 , and discharges gas through an opening provided in the lens barrel 104 . The gas discharge unit 501 includes a connection portion 501a connected to the lens barrel 104, a pipe 501b, and an exhaust mechanism 501c. Through the exhaust action of the exhaust mechanism 501c, the gas is discharged from the inner space of the lens barrels 103, 104 through the pipe 501b. The increase in size of the optical device 500 in the Z-axis direction can be alleviated by arranging the gas di...

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PUM

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Abstract

The invention relates to an optical device, a projection optical system, an exposure apparatus, and a method of manufacturing an article. Provided is an optical device provided with a gas supply mechanism that reduces the risk of light reaching an optical element being shielded from light. The optical device includes a first optical element and a second optical element; a holding unit that holds the first optical element and the second optical element; a gas supply unit that supplies a gas, the temperature of which has been controlled, to a flow path provided in the holding unit; and a gas discharge unit that discharges the gas supplied by the gas supply unit, in the optical device, the gas discharge unit is arranged side by side in the arrangement direction of the first optical element and the second optical element.

Description

technical field [0001] The present invention relates to an optical device, a projection optical system, an exposure device, and a method of manufacturing an article. Background technique [0002] It is known that in an optical device using optical elements such as lenses and mirrors, the optical performance of the optical device may be affected by the temperature change of the optical element or the space in the optical path. This may occur due to a change in the surface shape of the optical element, thermal deformation in the holding portion of the optical element, or a change in the refractive index of air. [0003] As one of the main causes of the above-mentioned optical element and the temperature change of the space in the optical path, light incident on the optical element can be mentioned. When light passes through the optical element or is reflected by the optical element, part of the light is absorbed by the optical element, thereby generating heat. Part of the ge...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70891G03F7/70233G02B27/0006G03F7/70316H01L21/027G03F7/70225
Inventor 西川原朋史关美津留矢田裕纪远藤淳生
Owner CANON KK
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