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Hall ion source and discharge system thereof

A Hall ion source and ion source technology, applied in discharge tubes, ion beam tubes, circuits, etc., can solve the problems of difficult ion implantation and deposition coating, uneven treatment of the inner wall of the tube, etc., to reduce self-sputtering and realize sputtering The uniformity and the effect of increasing the ionization rate

Pending Publication Date: 2021-02-12
THE ENG & TECHN COLLEGE OF CHENGDU UNIV OF TECH +2
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

For this method, there are still certain defects, that is, the treatment of the inner wall of the pipe is uneven, especially for pipes with small diameters, it is more difficult to achieve uniform ion implantation and deposition coating

Method used

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  • Hall ion source and discharge system thereof
  • Hall ion source and discharge system thereof
  • Hall ion source and discharge system thereof

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Embodiment Construction

[0039] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the present invention will be further described in detail below in conjunction with specific embodiments.

[0040] Such as Figure 1 to Figure 5 As shown, a Hall ion source includes a device body; the device body is made of insulating material and has a circular structure, and a notch 1 is provided on the outside; the two sides of the device body are respectively provided with first magnetic poles 2 and the second magnetic pole 3; the middle part of the device body is provided with a first permanent magnet 4 and a second permanent magnet 5 which are symmetrical to each other and pass through the device body and the two magnetic poles.

[0041]In this embodiment, the device body is composed of two parts, namely the first body 6 and the second body 7, and the first body 6 and the second body 7 are insulating materials; when the first body 6 and the second bod...

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Abstract

The invention belongs to the technical field of pipe wall processing devices, and discloses a Hall ion source which comprises a device body, wherein the device body is made of an insulating material and is of a circular structure, and a notch is formed in the outer side of the device body; a first magnetic pole and a second magnetic pole are arranged on the two side faces of the device body respectively; and a first permanent magnet and a second permanent magnet which are symmetrical to each other and penetrate through the device body and the two magnetic poles are arranged in the middle of the device body. Uniform ion beams can be led out in the 360-degree direction, and low self-sputtering and high working medium ionization rate are achieved. The invention also discloses a discharge system with the Hall ion source, so that the Hall ion source can cope with different working conditions in different working modes.

Description

technical field [0001] The invention belongs to the technical field of tube wall processing devices, and in particular relates to a Hall ion source and a discharge system thereof. Background technique [0002] At present, in order to prolong the service life of various types of pipes, the inner walls of the pipes are usually treated, that is, foreign atoms are doped toward the inner wall surface, so as to improve the chemical and / or physical properties of the pipes in industrial processes. [0003] In order to achieve the above goals, there are technical solutions such as chemical vapor deposition and anodizing treatment to treat the inner wall of the tube, but these methods have defects such as weak bonding force between the film layer and the substrate, and too complicated treatment technology. [0004] At present, ions, electrons and other high-energy particles in the plasma have been widely used in substrate cleaning and assisting and controlling the growth process of th...

Claims

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Application Information

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IPC IPC(8): H01J27/14
CPCH01J27/143H01J27/146
Inventor 赵杰许丽唐德礼朱剑豪阮庆东全刚李建郑才国黄勇张帆李平川
Owner THE ENG & TECHN COLLEGE OF CHENGDU UNIV OF TECH
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