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High flow multi-way piston valve for deposition systems

一种活塞、膜沉积的技术，应用在用于沉积系统的高流量多通活塞阀领域，能够解决阀不良流量系数、不适用、高流量隔膜阀性能损害等问题

Active Publication Date: 2021-02-12
LAM RES CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Additionally, some typical valve systems using diaphragm valves are limited by the valve's poor flow coefficient, so these valve systems are not suitable for systems that require high flow rates (within very small spatial confines) (for example, to perform deposition)
That is, the performance of conventional high flow diaphragm valves suffers when the space is smaller than typically encountered

Method used

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  • High flow multi-way piston valve for deposition systems
  • High flow multi-way piston valve for deposition systems
  • High flow multi-way piston valve for deposition systems

Examples

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Embodiment Construction

[0032] Although the following detailed description contains many specific details for purposes of illustration, those skilled in the art will understand that many variations and modifications of the following details are within the scope of the invention. Accordingly, the aspects of the invention described below are set forth without any loss of generality and without limitation to the claims that follow.

[0033] In general, embodiments of the present disclosure describe systems and methods that provide novel methods for switching liquid chemical flow to multiple outlet paths using a piston assembly as a valve with a low pressure drop across the piston assembly, Wherein the piston assembly is suitable for depositing (eg, wet deposition) a film on a wafer in a processing chamber (eg, an electroplating bath). The piston assembly includes an inner piston with multiple holes that are actuated back and forth to alter the flow path depending on which hole is aligned with the flow p...

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Abstract

A valve assembly used with a process chamber for depositing a film on a wafer. A valve body surrounds a bore and includes an inlet, a first outlet and a second outlet, at least one of them exiting into the process chamber. A piston includes a first section having a first flow path, and a second section having a second flow path. A linear motion actuator is adapted to couple with the piston and controls linear movement of the piston through the bore between a first position and a second position. In the first position, the first section of the piston is aligned with the inlet such that fluid flows to the first outlet via the first flow path. In the second position, the second section of the piston is aligned with the inlet such that fluid flows to the second outlet via the second flow path.

Description

Background technique [0001] In semiconductor processing systems that include performing deposition, fluid delivery is performed through conduits with valve systems to control the fluid flow paths. These valve systems meet certain high-purity chemical ratings suitable for fluid handling. However, valve systems complying with the above characteristics typically have very large bodies relative to the inner diameter of the pipes, which precludes the use of these typical valve systems in processing systems with narrow space constraints. Additionally, some typical valve systems using diaphragm valves are limited by poor flow coefficients of the valves, so these valve systems are not suitable for systems requiring high flow rates (in very small spatial confines) (eg, for performing deposition). That is, the performance of conventional high flow diaphragm valves suffers when the space is smaller than typically encountered. [0002] The background description provided herein is for t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/687H01L21/02
CPCC25D21/12F16K11/0716F16K27/041C25D7/12F16K3/262C25D17/002C25D17/001H01L21/67017H01L21/68721H01L21/67276H01L21/67253H01L21/02263F16K37/0041F16K31/1221F16K11/0856
Inventor 詹姆斯·艾萨克·福特纳罗伯特·拉什亚伦·贝尔克冯敬斌
Owner LAM RES CORP