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Manufacturing process determination device of substrate processing device, substrate processing system, manufacturing process determination method for substrate processing apparatus, learning model group, method for generating learning model group, and program

A technology of substrate processing device and manufacturing process, which is applied in the direction of nuclear method, calculation model, integrated learning, etc., can solve the problems of learning model restoration, no public learning model, and the inability to reduce the judgment accuracy, and achieve the effect of suppressing the reduction of judgment accuracy

Active Publication Date: 2021-04-13
SUMITOMO PRECISION PROD CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] However, also in this case, since the relearned learning model cannot be recovered even if the judgment accuracy of the relearned learning model is lowered, it is necessary to repeat the relearning until the desired judgment accuracy is obtained, and it takes a lot of time. labor and time
[0010] Patent Documents 1 to 3 do not disclose any means for solving the above-mentioned problems in the relearning of the learning model

Method used

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  • Manufacturing process determination device of substrate processing device, substrate processing system, manufacturing process determination method for substrate processing apparatus, learning model group, method for generating learning model group, and program
  • Manufacturing process determination device of substrate processing device, substrate processing system, manufacturing process determination method for substrate processing apparatus, learning model group, method for generating learning model group, and program
  • Manufacturing process determination device of substrate processing device, substrate processing system, manufacturing process determination method for substrate processing apparatus, learning model group, method for generating learning model group, and program

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no. 1 approach

[0061] figure 1 It is a figure which schematically shows the outline structure of the substrate processing system which concerns on 1st Embodiment. figure 1 (a) is an overall configuration diagram of the substrate processing system. figure 1 (b) is a block diagram showing a schematic configuration of a manufacturing process judging device. figure 1 (c) is a figure which schematically shows the display example of the monitor screen of the computer which comprises a manufacturing process determination apparatus. In addition, in figure 1 In (a), parameters to be measured are shown surrounded by dotted rectangles.

[0062] Such as figure 1 As shown in (a), the substrate processing system 100 according to the first embodiment includes a substrate processing apparatus 10 and a manufacturing process determination apparatus 20 .

[0063] A substrate processing apparatus 10 according to the first embodiment includes a chamber 1 and a mounting table 2 arranged in the chamber ...

no. 2 approach

[0136] Figure 7 It is a figure which schematically shows the outline structure of the substrate processing system which concerns on 2nd Embodiment. In addition, in Figure 7 , also with the above figure 1 Similarly to (a), parameters to be measured are shown surrounded by dotted rectangles. exist Figure 7 , omitting the same as the above figure 1 (b) Schematic representation of the equivalent structure.

[0137] Such as Figure 7 As shown, the substrate processing system 200 according to the second embodiment includes a substrate processing apparatus 10A and a manufacturing process determining apparatus 20 .

[0138] Hereinafter, differences from the substrate processing system 100 according to the first embodiment will be mainly described, and the same components as those in the substrate processing system 100 according to the first embodiment will be assigned the same reference numerals and descriptions will be omitted.

[0139] A substrate processing apparatus 10...

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Abstract

The invention provides a manufacturing process determination device of a substrate processing device, which can easily inhibit the reduction of determination precision. The manufacturing process determination device (20) is provided with: a process log acquisition unit (21) that acquires process log data of a substrate processing device (10); and a determination unit (22) that creates input data on the basis of the process log data and performs determination relating to the manufacturing process of the substrate processing device on the basis of the input data. The determination unit is provided with a plurality of learning models (25) that are generated by performing machine learning using mutually different teacher data, the input data is input into each of the learning models (25), and the determination results relating to the manufacturing process are output from each of the learning models (25). The determination unit is capable of performing determination by switching which of the plurality of learning models is to be used.

Description

technical field [0001] The present invention relates to a manufacturing process judging device for a substrate processing device that performs judgment related to a manufacturing process of a substrate processing device, a substrate processing system including the manufacturing process judging device for a substrate processing device, a manufacturing process judging method for a substrate processing device, A learning model set, a method for generating the learning model set, and a program. In particular, the present invention relates to a manufacturing process judging device for a substrate processing apparatus, a substrate processing system, a manufacturing process judging method for a substrate processing apparatus, a learning model set, a method for generating a learning model set, and program. Background technique [0002] Conventionally, devices described in Patent Documents 1 to 3, for example, have been proposed as devices for performing judgments related to the man...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/3065
CPCC23C16/52G06N20/20G06N20/10G06N3/045G06N20/00C23C16/50G06F18/214
Inventor 花田克司藤原佑挥
Owner SUMITOMO PRECISION PROD CO LTD