Substrate processing device
A technology of a substrate processing device and a processing unit, which is applied in the directions of separation methods, dispersed particle separation, chemical instruments and methods, etc., can solve the problems of increased pressure loss of exhaust pipes, larger occupied area, and longer exhaust pipe lengths, etc.
Pending Publication Date: 2021-04-30
DAINIPPON SCREEN MTG CO LTD
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Problems solved by technology
[0003] However, as shown in Document 1, when the exhaust switching device is arranged in the sub-clean area, the length of the continuous exhaust pipe from the processing part of the substrate processing device to the exhaust switching device becomes long, so the exhaust The pressure loss in the pipe will become larger
It can be considered to arrange the exhaust switching device on the side of the processing part to shorten the exhaust pipe, but the overall footprint of the substrate processing device will become larger
Method used
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[0026] figure 1 It is a figure which shows the appearance of the substrate processing apparatus 1 which concerns on one Embodiment of this invention. The substrate processing apparatus 1 is a sheet-type apparatus in which substrates 9 are processed one by one in a processing unit 31 described later. exist figure 1 In , three directions orthogonal to each other are shown as the X direction, the Y direction, and the Z direction. Typically, the Z direction is an up-down direction (vertical direction), and the X and Y directions are horizontal directions.
[0027] figure 2 It is a plan view showing the substrate processing apparatus 1 seen from the (+Z) side toward the (−Z) direction. Such as figure 1 as well as figure 2 As shown, the substrate processing apparatus 1 has a control unit 10 , a support frame 20 , a container mounting unit 21 , an index robot 22 , a central robot 23 , a plurality of stacking units 3 , and a plurality of manifold sets 6 . The control unit 10 ...
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A substrate processing device (1) comprises a plurality of converging pipes (61a to 61c) arranged above a plurality of processing units (31) arrayed in a vertical direction. The plurality of converging pipes (61a to 61c) respectively correspond to a plurality of fluid sections. Further, a plurality of exhaust pipes (4) which extend upward from the plurality of processing units (31) and into which exhaust from the plurality of processing units (31) flows are provided. A flow path switch unit (5) is provided at the upper end of each of the exhaust pipes (4) to connect the upper end to the plurality of converging pipes (61a to 61c) and to switch the flow path of exhaust flowing through the exhaust pipes (4) between the plurality of converging pipes (61a to 61c). With the substrate processing device (1), it is possible to reduce pressure loss in the exhaust pipe (4) and to make footprint smaller.
Description
technical field [0001] The present invention relates to a substrate processing device. Background technique [0002] Conventionally, in the manufacture of semiconductor devices, substrate processing apparatuses for processing semiconductor substrates (hereinafter, simply referred to as “substrates”) using various processing fluids are used. In addition, JP-A-2016-72480 (Document 1) discloses a discharge port for switching the outlet of the exhaust gas discharged from the substrate processing device among three exhaust processing devices according to the type of processing fluid. Gas switching device. In Document 1, a substrate processing apparatus is installed in a clean room, and an exhaust switching device is installed in a lower space of the clean room called a sub-clean area. By installing an exhaust switching device, the environmental load can be reduced. In addition, International Publication No. WO2014 / 103523 discloses an exhaust switching device in which exhaust s...
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IPC IPC(8): H01L21/304
CPCH01L21/304H01L21/67017H01L21/67253H01L21/67173H01L21/67178B01D46/0041B08B15/02H01L21/67051H01L21/6719
Inventor 西出基姜贵畅松本隆雄
Owner DAINIPPON SCREEN MTG CO LTD