Disturbance force measuring device of immersion control unit

A technology of control unit and measuring device, which is applied in the direction of measuring device, exposure device of photo-plate making process, measuring fluid pressure, etc., can solve the problems of adverse influence of immersion liquid flow control, immersion flow field fluctuation, force disturbance, etc., and achieve effective and reliable measurement , to ensure the effect of measurement accuracy

Active Publication Date: 2021-05-11
ZHEJIANG CHEER TECH CO LTD
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Problems solved by technology

[0005] The present invention solves the problem that the method of continuously updating the immersion flow field through liquid injection and recovery in the existing immersion lithography machine will cause fluctuations in the immersion flow field, and cause force disturbances to the immersion control unit used to limit the flow field. The positioning of the immersion control unit will cause adverse effects, even cause damage to the immersion control unit and its subsidiary mechanisms, or have adverse effects on the

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  • Disturbance force measuring device of immersion control unit
  • Disturbance force measuring device of immersion control unit
  • Disturbance force measuring device of immersion control unit

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Example Embodiment

[0024]More specific embodiments are as follows:

[0025]Such asfigure 1 ,image 3 ,Figure 4 withFigure 5As shown, the perturbation force measuring device of the present invention, including the base 26, analog objective mechanism, analog substrate mechanism, and force measuring mechanism; the base 26 has a large mass and stiffness to ensure isolation from The environment is disturbed; the simulator mirror mechanism includes an mimer mirror 2 and the objective connecting member 25, and the objective lens connector 25 is fixedly coupled to the base 26; the analog substrate mechanism includes substrate 3 and a substrate 31 carrying substrates 31 The substrate 3 may be a silicon wafer or a photoresist silicon, to simulate the characteristics of the substrate surface of the soaking flow field in the real photolithography, and the substrate table 31 can be fixed, or the simulated real photolithography The moving table can be moved in the plane; the force measurement mechanism is connected to ...

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Abstract

The invention discloses a disturbance force measuring device of an immersion control unit. The device comprises a base, a simulation objective lens mechanism, a simulation substrate mechanism and a force measuring mechanism, the simulation objective lens mechanism comprises a simulation objective lens and an objective lens connecting piece, and the simulation objective lens is fixedly connected with the base through the objective lens connecting piece; the simulation substrate mechanism comprises a substrate and a substrate table for bearing the substrate, the immersion control unit and the force measuring mechanism are sequentially arranged above the substrate, the upper end of the force measuring mechanism is connected with the base, the force measuring mechanism is provided with a force measurer and a displacement adjusting structure, and the force measurer is arranged above the simulation objective lens; and the immersion control unit is positioned around the radial outer side of the simulation objective lens and above the substrate, and keeps a gap with the simulation objective lens and the substrate, respectively. The disturbance force from the immersion flow field borne by the immersion control unit is effectively measured and evaluated, reliable positioning of the immersion control unit under the force disturbance of the immersion flow field is better guaranteed, the spatial shape stability of the immersion flow field is guaranteed, and the effective reliability of disturbance force measurement is guaranteed.

Description

technical field [0001] The invention relates to the technical field of immersion photolithography, in particular to a measuring device for measuring the force disturbance received by an immersion control unit. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. It uses the optical system to accurately project the circuit pattern on the mask onto the photoresist-coated substrate and modify the photoresist exposure to modify the photoresist. Circuit pattern information is left on the substrate. It includes a laser light source, a projection objective lens system, a projection mask containing circuit patterns and a substrate coated with photosensitive photoresist. [0003] Compared with the dry lithography machine in which the intermediate medium is gas, the immersion lithography (Immersion Lithography) equipment fills a liquid with a high refractive index (called immersion liquid or immersion liquid) between the last proj...

Claims

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Application Information

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IPC IPC(8): G01L11/00G03F7/20
CPCG01L11/00G03F7/2041G03F7/70341
Inventor 符文静王帅胡归徐文苹徐宁付新
Owner ZHEJIANG CHEER TECH CO LTD
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