Disturbance force measuring device of immersion control unit
A technology of control unit and measuring device, which is applied in the direction of measuring device, exposure device of photo-plate making process, measuring fluid pressure, etc., can solve the problems of adverse influence of immersion liquid flow control, immersion flow field fluctuation, force disturbance, etc., and achieve effective and reliable measurement , to ensure the effect of measurement accuracy
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[0024]More specific embodiments are as follows:
[0025]Such asfigure 1 ,image 3 ,Figure 4 withFigure 5As shown, the perturbation force measuring device of the present invention, including the base 26, analog objective mechanism, analog substrate mechanism, and force measuring mechanism; the base 26 has a large mass and stiffness to ensure isolation from The environment is disturbed; the simulator mirror mechanism includes an mimer mirror 2 and the objective connecting member 25, and the objective lens connector 25 is fixedly coupled to the base 26; the analog substrate mechanism includes substrate 3 and a substrate 31 carrying substrates 31 The substrate 3 may be a silicon wafer or a photoresist silicon, to simulate the characteristics of the substrate surface of the soaking flow field in the real photolithography, and the substrate table 31 can be fixed, or the simulated real photolithography The moving table can be moved in the plane; the force measurement mechanism is connected to ...
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