Lithium niobate modulator chip and manufacturing method thereof
A production method and technology of lithium niobate, which can be applied to instruments, light guides, optics, etc., can solve problems affecting the full-temperature optical performance of lithium niobate modulators, changing the effective refractive index of lithium niobate waveguides, etc.
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Embodiment 1
[0040] The pyroelectric effect of lithium niobate optical waveguide can be referred to figure 1 : The lithium niobate modulator chip includes a lithium niobate substrate 1 and an optical waveguide 3, and the lithium niobate substrate 1 adopts lithium niobate crystal. The lithium niobate modulator chip uses the electro-optic effect of lithium niobate crystal to convert electrical signals into optical signals. In order to obtain the best modulation efficiency, it is necessary to make full use of the maximum electro-optic coefficient γ33 of lithium niobate. Since γ33 is parallel to the Z axis of the lithium niobate crystal, an optical waveguide 3 with X cut and Y transmission should be selected. At the same time, based on the pyroelectric properties of lithium niobate crystals, lithium niobate crystals will exhibit spontaneous polarization when the temperature changes; the spontaneous polarization axis of lithium niobate crystals is also parallel to the Z axis of lithium niobate ...
Embodiment 2
[0048] On the basis of the above-mentioned embodiment 1, the embodiment of the present invention further provides a method for manufacturing a lithium niobate modulator chip, which is used for manufacturing the lithium niobate modulator chip described in embodiment 1. Such as image 3 As shown, the manufacturing method provided by the embodiment of the present invention mainly includes the following steps:
[0049] In step 10, a mask 2 is formed on the upper surface of the lithium niobate substrate 1 .
[0050] Wherein, the lithium niobate substrate 1 is an X-cut lithium niobate substrate, and the mask 2 is SiO 2 mask or Si 3 N 4 Mask, after making mask 2 on the upper surface of described lithium niobate substrate 1, form such as Figure 4 structure shown.
[0051] Step 20, etching an optical waveguide mask window on the mask 2 along the Y-axis direction, and fabricating an optical waveguide 3 on the upper surface of the lithium niobate substrate 1 inside the optical wave...
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