Dielectric filter migration modeling debugging method based on mechanism guidance data acquisition
A dielectric filter and data acquisition technology, applied to waveguide devices, electrical components, circuits, etc., can solve problems such as different mapping relationships, reduced debugging efficiency, and inability to model debugging, so as to improve efficiency, improve debugging efficiency, and shrink range effect
Active Publication Date: 2021-06-11
CHINA UNIV OF GEOSCIENCES (WUHAN)
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Problems solved by technology
[0004] In the debugging of dielectric filters with the same structure and different batches, due to the different mapping relationship between structural parameters and scattering parameters, the model obtained from the same batch of data cannot be used for debugging
Collecting a large amount of data on each batch of dielectric filters to retrain the model will reduce debugging efficiency
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[0036] In order to have a clearer understanding of the technical features, purposes and effects of the present invention, the specific implementation manners of the present invention will now be described in detail with reference to the accompanying drawings.
[0037] The embodiment of the present invention provides a dielectric filter migration modeling and debugging method based on mechanism guidance data collection, which is used to establish a debugging decision model suitable for different batches of dielectric filters, and realizes from the depth of the resonant hole of the dielectric filter to the reflection The mapping of the scattering parameters (S parameters) of the filtering performance is mainly divided into five steps, such as figure 1 shown.
[0038] In the fitting analytical formula part, according to the correlation between the depth of the resonator hole, the dielectric constant and the center frequency, the depth of all the resonator holes h = [h 1 ,h 2 ,....
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The invention provides a dielectric filter migration modeling debugging method based on mechanism guidance data acquisition, and the method comprises the steps: carrying out the fitting according to the correlation among the depth of a resonant hole, the dielectric constant and the center frequency, and obtaining an analytical expression between the depth of the resonant hole and the center frequency, and between the dielectric constant and the center frequency; calculating a data acquisition range of the first batch of dielectric filters; establishing a debugging decision model suitable for the first batch of dielectric filters, wherein the debugging decision model is used for debugging the first batch of dielectric filters; calculating a data acquisition range of any other batch of dielectric filters; and establishing a debugging decision model suitable for any other batch of dielectric filters, wherein the debugging decision model is used for debugging any other batch of dielectric filters. The method has the beneficial effects that the data acquisition range is reduced, the data acquisition efficiency is improved, the modeling method for the strong individual difference dielectric filter is more flexible, the debugging efficiency of the dielectric filter is further improved, and the method has practicability and applicability.
Description
technical field [0001] The invention relates to the field of microwave filters, in particular to a method for modeling and debugging dielectric filter migration based on mechanism-guided data collection. Background technique [0002] The dielectric filter is a microwave filter made of ceramic materials. With the advantages of small size and low loss, it has become the mainstream frequency selection device for 5G base stations. Affected by the poor consistency of the dielectric constant of different batches of ceramic materials, the scattering parameters (reflecting the filtering performance) of the same structure and different batches of dielectric filters will be different, and the mapping relationship between the structural parameters and the scattering parameters is also different. . [0003] In the production process of dielectric filters, due to the existence of design errors, processing tolerances and differences in the characteristics of ceramic materials, the proces...
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Login to View More IPC IPC(8): H01P1/20H01P11/00G01R23/02
CPCH01P1/2002H01P11/007G01R23/02
Inventor 曹卫华郭琳炜毕乐宇袁艳
Owner CHINA UNIV OF GEOSCIENCES (WUHAN)