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Chip rack positioning device in sensor monocrystalline silicon etching process

A positioning device and monocrystalline silicon technology, which is applied in the direction of single crystal growth, single crystal growth, crystal growth, etc., can solve the problems that affect the user's work efficiency, inconvenient disassembly and assembly, etc., achieve good shock absorption and ensure stability Sex, the effect of reducing impact force

Inactive Publication Date: 2021-07-13
JIAXING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

"The support structure on the device is relatively fixed, which is inconvenient for users to disassemble and assemble the device, which affects the work efficiency of users

Method used

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  • Chip rack positioning device in sensor monocrystalline silicon etching process
  • Chip rack positioning device in sensor monocrystalline silicon etching process
  • Chip rack positioning device in sensor monocrystalline silicon etching process

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Embodiment Construction

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0034] see Figure 1-8 , an embodiment provided by the present invention: a chip holder positioning device in the etching process of sensor monocrystalline silicon, including a casing 1, a support 3, a turntable 6 and an air pump 8, and the outer wall of the casing 1 is installed by bolts There is an adjustment arm 2, and the shell 1 is composed of a metal material with high hardness. The metal material can resist the high-intensity air pressure, avoiding the ...

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PUM

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Abstract

The invention discloses a chip rack positioning device in a sensor monocrystalline silicon etching process. The device comprises a shell, a supporting piece, a rotary table and an air delivery pump, an adjusting arm is mounted on the outer wall of the shell through a bolt, tightening bolts are mounted on the two sides of the top of the shell in a penetrating manner, a top cover is mounted on the top of the shell through the tops of the tightening bolts, a supporting piece is installed on the inner wall of the top of the top cover in a penetrating mode, a ventilation pipe is installed on the inner wall of the top of the top cover in a penetrating mode, the ventilation pipe is located on one side of the supporting piece, a motor is installed at the bottom of the shell through bolts, and the output end of the motor penetrates through the bottom of the shell to be connected with a rotating rod. The gas pressure sensor can sense the content of reaction gas in the shell, the detected reaction gas is conveyed to the supporting piece and conveyed to a display through the supporting piece, information is displayed through the display, and a user can conveniently know the change of gas pressure and gas components in the shell.

Description

technical field [0001] The invention relates to the technical field of electronic equipment, in particular to a chip holder positioning device in the etching process of sensor single crystal silicon. Background technique [0002] In microelectronics technology, to manufacture an integrated circuit, it needs to go through several processes such as integrated circuit design, mask manufacturing, raw material manufacturing, chip processing, packaging, and testing. In this process, etching the semiconductor silicon wafer to form process trenches is the key technology. Commonly used etching methods include wet etching and dry etching. Wet etching refers to the method of etching by chemical reaction using liquid chemical reagents or solutions; dry etching mainly uses low-voltage discharge The ions or free radicals (molecules, atoms, and various atomic groups in the excited state) in the generated plasma react chemically with the material or achieve the purpose of etching through p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/12C30B29/06
CPCC30B29/06C30B33/12
Inventor 赵浩周斌斌李洪武习聪玲周丽许聚武王挺陈晟
Owner JIAXING UNIV