Filtering system for recovering polishing solution

Abstract

The invention discloses a filtering system for recovering a polishing solution. The filtering system comprises a liquid collecting barrel, a conveying pipe, a waste liquid collecting barrel, a stirring rod and stirring blades, the waste liquid collecting barrel is arranged outside the liquid collecting barrel, the conveying pipe is installed on the outer wall, on one side of the waste liquid collecting barrel, of the liquid collecting barrel, a liquid inlet is formed in the top end of the waste liquid collecting barrel, the bottom end of the liquid inlet extends into the waste liquid collecting barrel, a compressor is arranged on the side, away from the liquid collecting barrel, of the waste liquid collecting barrel, a water-liquid separator is arranged on the side, away from the waste liquid collecting barrel, of the compressor, a drainage pipe is installed at the bottom end of the water-liquid separator, the top end of the drainage pipe extends into the water-liquid separator, and a circulating pipeline is arranged outside the water-liquid separator above the drainage pipe. According to the invention, the efficient recycling of the polishing solution by the filtering system is realized, the problems of pollution and waste of the waste polishing solution are solved, the production cost is reduced, and the working efficiency of the filtering system is improved.

Description

technical field [0001] The invention relates to the technical field of filtration systems, in particular to a filtration system for recycling polishing liquid. Background technique [0002] Chemical mechanical polishing technology is the only surface finishing technology that can provide global planarization so far. It has been widely used in the planarization of surfaces such as inherited circuit chips and micro-mechanical systems. With the increasing size of workpieces and the processing accuracy Gradually improving, chemical mechanical polishing, as a technology suitable for this demand, has now developed into an inevitable choice in the polishing process. For example, metal polishing in microelectronics is only used once, and the overall impact cost is relatively large. Polishing fluid generally includes water, abrasives, Various chemical reagents, etc. During the use of the polishing liquid, the chemical reagents react with the material to be thrown to generate various ...

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a filter system for polishing liquid recovery, to solve the problem that the filter system in the above background technology is not convenient for efficient recycling of polishing liquid

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