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ZnSn alloy target material and preparation method thereof

A technology of alloy target and mixed powder, which is applied in the field of target materials, can solve the problems of large difference in melting point between Zn and Sn, inability to completely fuse, unfavorable application, etc., and achieve the effect of good density and grain

Pending Publication Date: 2021-08-27
GEMCH MATERIAL TECH SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] ZnSn alloy target is a commonly used sputtering target. The traditional preparation method of ZnSn alloy target is to shape Zn ingot and Sn ingot in a mold after high temperature melting. However, due to the large difference in melting point of Zn and Sn ( The melting point of Zn is 419.53°C, and the melting point of Sn is 231.89°C), so that the two cannot be completely fused. Therefore, in the casting process, due to the difference in cooling degree, it is easy to cause defects such as segregation, holes, porosity, and cracks, resulting in ZnSn alloy targets obtained by traditional preparation methods. material is not conducive to the application

Method used

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  • ZnSn alloy target material and preparation method thereof
  • ZnSn alloy target material and preparation method thereof
  • ZnSn alloy target material and preparation method thereof

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preparation example Construction

[0027] See figure 1 , the preparation method of the ZnSn alloy target material of one embodiment of the present invention, comprises the following steps:

[0028] S1. Mix the Zn powder and the Sn powder uniformly to obtain a mixed powder.

[0029] 3N5 nano Zn powder and nano Sn powder can be used as raw materials. In one embodiment, the D50 of the Zn powder and the Sn powder are both 30 μm˜60 μm.

[0030] In one of the embodiments, the operation of uniformly mixing Zn powder and Sn powder is as follows: according to the mass parts, 45-55 parts of Zn powder, 45-55 parts of Sn powder and zirconia balls are added to the mixture In-machine mixing. Zirconium dioxide balls have good stability and will not cause adverse effects on Zn powder and Sn powder, which is beneficial to ball milling and mixing. It should be noted that ball milling is not limited to using zirconia balls, and balls of other materials can also be used.

[0031] In one embodiment, the mass ratio of the mixtu...

Embodiment 1

[0051] 3N5 nano-Zn powder and nano-Sn powder are selected as raw materials, and the specifications of both Zn powder and Sn powder are selected as D50 of 35 μm.

[0052] S1. Add 2400g of Zn powder, 2600g of Sn powder and zirconia balls into a mixer for mixing to obtain a mixed powder. Among them, the mass ratio of the mixture of Zn powder and Sn powder to zirconia balls is 1:2, and the specifications of zirconia balls include Φ2mm, Φ5mm, Φ10mm, Φ20mm and Φ25mm, and the number of balls in each specification is the same. The speed of the mixer is 125r / min, and the mixing time is 15h.

[0053] S2. Perform pre-press molding on the mixed powder obtained in step S1. The pre-press molding equipment is a four-column hydraulic press with a pressure of 450T and a holding time of 10 minutes to obtain a ZnSn alloy blank.

[0054] S3. Strengthening the ZnSn alloy blank obtained in step S2 by adopting a cold isostatic pressing process. The cold isostatic pressing pressure is 280 MPa, and t...

Embodiment 2

[0057] 3N5 nano-Zn powder and nano-Sn powder are selected as raw materials, and the specifications of Zn powder and Sn powder are both selected to have a D50 of 60 μm.

[0058] S1. Add 2500g of Zn powder, 2500g of Sn powder and zirconia balls into a mixer for mixing to obtain a mixed powder. Among them, the mass ratio of the mixture of Zn powder and Sn powder to zirconia balls is 1:2.5, and the specifications of zirconia balls include Φ2mm, Φ5mm, Φ10mm, Φ20mm and Φ25mm, and the number of balls in each specification is the same. The speed of the mixer is 125r / min, and the mixing time is 10h.

[0059] S2. Perform pre-press molding on the mixed powder obtained in step S1. The pre-press molding equipment is a four-column hydraulic press with a pressure of 600T and a holding time of 5 minutes to obtain a ZnSn alloy blank.

[0060] S3. Strengthening the ZnSn alloy blank obtained in step S2 by adopting a cold isostatic pressing process. The cold isostatic pressing pressure is 300 MP...

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Abstract

The invention relates to a ZnSn alloy target material and a preparation method thereof. The preparation method of the ZnSn alloy target material comprises the following steps: Zn powder and Sn powder are uniformly mixed to obtain mixed powder; the mixed powder is subjected to pre-pressing forming, the pressure is 400 T or above, pressure maintaining treatment is conducted, and a ZnSn alloy blank is obtained; strengthening treatment on the ZnSn alloy blank by adopting a cold isostatic pressing process is conducted to obtain a ZnSn alloy target blank; and the ZnSn alloy target blank is bound and formed, and the ZnSn alloy target material is obtained. According to the preparation method of the ZnSn alloy target material in the technical scheme, the raw materials Zn and Sn in the powder state are adopted, then the mixed powder is pre-pressed to obtain the ZnSn alloy blank with the initial shape, then cold isostatic pressing is adopted for strengthening treatment, and the high-performance ZnSn alloy target material with good compactness and crystal grains can be obtained.

Description

technical field [0001] The invention relates to the technical field of target materials, in particular to a ZnSn alloy target material and a preparation method thereof. Background technique [0002] Sputtering coating is a technology that uses energetic particles to bombard the target surface in a vacuum, so that the bombarded particles are deposited on the substrate. Magnetron sputtering coating is widely used due to its two advantages of low temperature and fast speed. The target material used for sputtering coating is required to have fine grains and no organizational defects. [0003] ZnSn alloy target is a commonly used sputtering target. The traditional preparation method of ZnSn alloy target is to shape Zn ingot and Sn ingot in a mold after high temperature melting. However, due to the large difference in melting point of Zn and Sn ( The melting point of Zn is 419.53°C, and the melting point of Sn is 231.89°C), so that the two cannot be completely fused. Therefore, i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C22C13/00C22C18/00
CPCC23C14/35C23C14/3414C22C18/00C22C13/00
Inventor 张玉玲甘志俭
Owner GEMCH MATERIAL TECH SUZHOU