A large-scale preparation method for microstructures that enhance heat transfer
A technology to enhance heat transfer and microstructure, applied in electrochemical processing equipment, manufacturing tools, metal processing equipment, etc., can solve the problems of long preparation time, cumbersome steps, time-consuming and laborious, etc., and achieve good surface quality and thickness control Precise, wide-ranging effects
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0048] Step 1): electroforming a nickel metal layer A2 with a thickness of 25 μm on the upper surface of the copper substrate 1, and then polishing the nickel metal layer A2 until the surface roughness of the nickel metal layer A is Ra<0.2;
[0049] Step 2): Coating a layer of PDMS template 3 on the surface of the polished nickel metal layer A, opening a through hole on the surface of the template to obtain a workpiece, the thickness of the PDMS template 3 is 250 μm, the diameter of the micro-through hole is 100 μm, and the number of micro-through holes is 30* 30;
[0050] Step 3): The workpiece is subjected to electrolytic processing, the voltage is 12V, the duty cycle is 20%, the electrolyte is 100g / L sodium nitrate solution, the pressure is 0.1MPa, and the electrolysis is 2min;
[0051] Step 4): Remove the PDMS template 3, then drop acidic copper etching solution 4 at the electrolytic processing position of the workpiece, and etch at 30°C for 4 minutes; operation;
[0052...
Embodiment 2
[0056] Step 1): electroforming a layer of nickel metal layer A2 with a thickness of 25 μm on the upper surface of the iron substrate 1, and then polishing the nickel metal layer A2 until the surface roughness of the nickel metal layer A2 is Ra<0.2;
[0057] Step 2): coating a layer of SU-8 dry film photoresist mold 3 with a through hole on the surface of the polished nickel metal layer A2 to obtain a workpiece, the thickness of the SU-8 dry film photoresist mold 3 is 25 μm, micro The diameter of the through hole is 100μm, and the number of micro through holes is 30*30;
[0058] Step 3): The workpiece is subjected to electrolytic processing, the voltage is 12V, the duty cycle is 20%, the electrolyte is 100g / L sodium nitrate solution, the pressure is 0.1MPa, and the electrolysis is 2min;
[0059] Step 4): Add acidic copper chloride etching solution 4 dropwise at the workpiece electrolytic processing position, and etch at 30°C for 4 minutes; during the etching process, perform me...
Embodiment 3
[0063] Same as embodiment 1, the difference is that the substrate is copper, and the metal A is gold.
[0064] In this embodiment, 900 microgrooves of 30*30 can be processed at the same time, and the microgrooves have a complete structure, no defects such as burrs, burrs, and air bubbles, and the microgrooves are uniform in size.
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


