Light-emitting device and preparation method thereof
A technology of light-emitting devices and semiconductors, applied in semiconductor devices, electrical components, circuits, etc., can solve problems such as lattice defects, increased manufacturing costs, and slow film growth rates
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[0131] In addition to the formation of III-V compound protective layer on the surface of GaN nanorods by wet chemical reaction, and the formation of Al on the surface of III-V compound protective layer by wet chemical reaction 2 o 3 Except for the protective layer, a light-emitting device was fabricated in substantially the same manner as the formation of GaN nanorods in Comparative Example 1.
[0132] Evaluation Example 1: Lattice Defect Evaluation
[0133] The lattice defects of the light-emitting devices fabricated in Example 1 and Comparative Example 1 to Comparative Example 4 were evaluated using variable energy positron annihilation. The results are shown in Table 1.
[0134] Table 1
[0135] Light emitting device Lattice mismatch degree (%) Example 1 0.36 Comparative example 1 0.56 Comparative example 2 - Comparative example 3 13.8 Comparative example 4 10.8
[0136] Referring to the results of Table 1, it was found that...
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