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Chemical composition based on hydrosilapyrrole, hydrosilapyrrole and thio-silacyclopentane

A technology of heterocyclopentane and silicon hydride, which is applied in the field of chemical composition, can solve unsatisfied problems and achieve the effect of improving the surface

Pending Publication Date: 2021-12-10
ZHEJIANG SHUREN COLLEGE ZHEJIANG SHUREN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In the current main applications, these compounds either contain too much carbon or introduce oxygen into the film due to the replacement of silicon atoms in the ring, so new silicon nitride and silicon carbonitride of silicon nitride are deposited at low temperature Precursor needs remain unmet

Method used

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  • Chemical composition based on hydrosilapyrrole, hydrosilapyrrole and thio-silacyclopentane
  • Chemical composition based on hydrosilapyrrole, hydrosilapyrrole and thio-silacyclopentane
  • Chemical composition based on hydrosilapyrrole, hydrosilapyrrole and thio-silacyclopentane

Examples

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Effect test

example 1

[0026] The present invention provides chemical compositions based on silazapyrroles, silazapyrroles, and thiosilacyclopentanes, which include silazapyrroles, silazapyrroles, and silazapyrroles The chemical formula for cyclopentane, hydrosilazapyrrole or hydrosilazazapyrrole is:

[0027]

[0028] Wherein R is a substituted or unsubstituted organic group with a carbon or silicon bonded to ring nitrogen, and R' is an alkyl group;

[0029] The chemical formula of thiosilacyclopentane is:

[0030]

[0031] Wherein R" and R'" are hydrogen or alkyl respectively;

[0032] Wherein R in hydrogenated silazapyrrole or hydrogenated silazazapyrrole is alkyl, aryl, ester, chiral phenethylamine, trimethylsilyl or tertiary amino group, hydrogenated pyrrole, wherein in n-butyl-2 - Among silapyridines, hydrogenated silazapyrrole is (N-trimethylsilyl-2-methyl-silapyrrole), hydrogenated silazapyrrole or hydrogenated silazazapyrrole is used to prepare silicon nitride or carbonitride Silico...

example 2

[0035] On the basis of example 1, the present invention provides a technical solution: preferably, simple specific examples of the compound of the present invention include N-methyl-2-silapyrrole and N-butyl-2-silapyrrole: other examples include on nitrogen Those with more complex functional substitutions, including chiral phenethylamine, trimethylsilyl and tertiary amino groups, additionally the present invention also relates to a process for the production of the above-mentioned hydrosilazyrroles comprising reducing the corresponding Cyclic azasilanes with alkoxide substitutions, therefore, the only limitation on the hydrasilapyrroles that can be produced according to the process of the present invention is the ability to synthesize alkoxy-containing precursors, the materials of the present invention are achieved by interacting with inorganic and organic hydroxyl groups ( including hydroxyl groups on siliceous, aluminum, and titanium substrates), and ring-opening reactions wi...

example 3

[0037] On the basis of Example 1, the present invention provides a technical solution: Preferably, the thiosilacyclopentane compound of the present invention is described by a method similar to the above-mentioned method for preparing a hydrosilazyrrole: having an alkoxide group on silicon by reducing Grouped thiosilacyclopentane compounds, for example, 1-thia-2-silacyclopentanes are prepared from 2,2-alkoxy-1-thia-2-sila-cyclopentanes.

[0038] The following will be described in conjunction with non-limiting examples:

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Abstract

The invention discloses a chemical composition based on hydrogenated silapyrrole, hydrogenated silaza pyrrole and sulfo-silacyclopentane, and relates to the technical field of chemical compositions. The chemical composition comprises hydrogenated silaza pyrrole, hydrogenated silaza pyrrole and sulfo-silacyclopentane, and the chemical formula of the hydrogenated silapyrrole or hydrogenated silaza pyrrole is shown in the specification, wherein R is a substituted or unsubstituted organic group, one carbon or silicon is combined with cyclic nitrogen, and R' is an alkyl group. The present invention can react with separated silanols in a homogeneous solution, and also with other protons, the silyl hydride functional groups can remain intact, or, depending on the desired end product, can be dehydrogenated to form silicon carbonitride, can be used as a regiospecific reducing agent, or can be hydrosilylated; therefore, materials of the present invention have attractive forces in many applications, including the formation of silicon nitride and silicon carbonitride films.

Description

technical field [0001] The invention relates to the technical field of chemical compositions, in particular to chemical compositions based on hydrosilazapyrrole, hydrosilazazapyrrole and thiosilacyclopentane. Background technique [0002] At present, people are very interested in the molecular layer deposition of nano-featured devices, including semiconductors and micro-electromechanical systems. It is expected to deposit monomolecular layers quickly and preferably quantitatively with the least by-products. Silicon carbonitride thin films are widely used in various dielectric materials. , passivation and etch stop. [0003] The production process currently used to produce silicon nitride or silicon carbonitride films is described in U.S. Patent No. 6,200,100, and No. 4,200,666 uses trisilylamine ((SiH 3 ) 3 N) and an inert gas with optional ammonia; as described by A.Hochberg (Mat.Res.Soc.Symp, 24,509 (1991)) et al., diethylsilane and ammonia at 800 ° C, LPCVD process; an...

Claims

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Application Information

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IPC IPC(8): C07F7/10C07F7/08C01B21/068C01B21/082
CPCC07F7/10C07F7/0898C01B21/068C01B21/0828
Inventor 童建颖吴慧珍孙娜波
Owner ZHEJIANG SHUREN COLLEGE ZHEJIANG SHUREN UNIV